| Paper Abstract and Keywords |
| Presentation |
2011-10-20 16:45
Study on the electron gun for Micro-Column Electron Beam Takahiro Fujino, Akifumi Koike (RIE Shizuoka Univ), Masayoshi Nagao, Tomoya Yoshida, Takashi Nishi (AIST), Hidekazu Murata, Kentaro Sakai (Meijo Univ), Yoichiro Neo, Toru Aoki, Hidenori Mimura (RIE Shizuoka Univ) ED2011-65 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Our final goal is to fabricate truly meaning micro-column, that consists of micro-sized field emitter and electro optics lens by using semiconductor processes. When micro-columns could be integrated with high density, their finely focused multi-beams can also be realized. It has highly potential for maskless lithography (ML2). It was already reported that the previous micro-column with 5 stacked gate electrodes made a certain crossover less than 40 m in diameter. However, to reduce beam spot, the specification for electron gun was realized. After estimating from electron orbit simulation,it was cleared the following conditions, electron beam must be accelerated less than 10 eV and its diameter must be less than 300nm. The electron beam should be parallel, and so on.This report described about optimal structure of electron gun and its electron emission and optical properties. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Micro-column / Multi-beam / Maskless lithography / West electrode / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 111, no. 248, ED2011-65, pp. 27-32, Oct. 2011. |
| Paper # |
ED2011-65 |
| Date of Issue |
2011-10-13 (ED) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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| Download PDF |
ED2011-65 |