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Paper Abstract and Keywords
Presentation 2011-11-18 08:45
Current Density Analysis in Contact Area by Using Light Emission Diode Wafer
Shigeru Sawada, Shigeki Tsukiji (Mie Univ.), Terutaka Tamai (ElconTech Consulting), Yasuhiro Hattori (Autonetworks Lab.) EMD2011-88
Abstract (in Japanese) (See Japanese page) 
(in English) In order to clarify the theory of contact resistance, there are many reports in these years. Mathematically the
constriction current is derived from Laplace equation at one contact which shape is circle, ellipse, triangle and square. And
numerical approach for constriction current analysis was also preformed by Minowa and Sawada. Although there are many
reports on the contact resistance measurement, not many reports on the detailed behavior of current density distribution in the
contact area experimentally. Therefore, we attempted to observe the behavior of the current density distribution in the contact
by using semiconductor wafers. As a result, it was confirmed that electric current is uniformly distributed over the contact area
covered by an oxide film, while it is concentrated at the periphery of the contact if there is no oxide film at contact. And the
contact resistance of apparent contact area is almost same as real contact area which is also agree with the theory of multi-spot
contact when the number of A-spot is large enough.
Keyword (in Japanese) (See Japanese page) 
(in English) Constriction Resistance / Electrical Contact / Contact resistance / Current constriction / light emitting diode / Direct observation / Current density distribution /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 299, EMD2011-88, pp. 115-119, Nov. 2011.
Paper # EMD2011-88 
Date of Issue 2011-11-10 (EMD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee EMD  
Conference Date 2011-11-17 - 2011-11-18 
Place (in Japanese) (See Japanese page) 
Place (in English) Akita Univ. Tegata Campus 
Topics (in Japanese) (See Japanese page) 
Topics (in English) International Session IS-EMD2011 
Paper Information
Registration To EMD 
Conference Code 2011-11-EMD 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Current Density Analysis in Contact Area by Using Light Emission Diode Wafer 
Sub Title (in English)  
Keyword(1) Constriction Resistance  
Keyword(2) Electrical Contact  
Keyword(3) Contact resistance  
Keyword(4) Current constriction  
Keyword(5) light emitting diode  
Keyword(6) Direct observation  
Keyword(7) Current density distribution  
Keyword(8)  
1st Author's Name Shigeru Sawada  
1st Author's Affiliation Mie university (Mie Univ.)
2nd Author's Name Shigeki Tsukiji  
2nd Author's Affiliation Mie university (Mie Univ.)
3rd Author's Name Terutaka Tamai  
3rd Author's Affiliation ElconTech Consulting Inc (ElconTech Consulting)
4th Author's Name Yasuhiro Hattori  
4th Author's Affiliation Autonetworks Lab. (Autonetworks Lab.)
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Speaker Author-1 
Date Time 2011-11-18 08:45:00 
Presentation Time 20 minutes 
Registration for EMD 
Paper # EMD2011-88 
Volume (vol) vol.111 
Number (no) no.299 
Page pp.115-119 
#Pages 5 
Date of Issue 2011-11-10 (EMD) 

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