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Paper Abstract and Keywords
Presentation 2011-12-16 10:00
Crystalline orientation control of collimated sputtering film
Akito Honda, Naoki Honda (Touhoku Inst. of Tech.) MR2011-33
Abstract (in Japanese) (See Japanese page) 
(in English) Preparation of inclined orientation films was studied using oblique incidence collimated sputtering. Large deflection in the orientation direction was found to be realized only with the combination of the oblique incidence collimated sputtering and the under layer of Ta/Pt. Pt layer was effective to the inclination of the orientation down to a film thickness of 5 nm. The inclination angle of the Pt film was increased with increasing the Ar pressure during the deposition, but the orientation dispersion angle was also increased. Annealing was found to reduce the deflection angle for Pt single layer on the Ta seed layer. Although the deflection angle increased and the dispersion angle decreased by the annealing for Pt film with a cover layer of Ru, the dispersion angle of Co-Cr film deposited on the Ru layer showed an extremely large value. Inevitable exposure process of the Ru film surface to atmosphere due to our sputtering apparatus could be the cause of the dispersion increase. It was found that minimized degassing process temperature resulted in a large deflection angle of 7.8-deg. with a relatively small dispersion angle of less than 9-deg. for a Co-Cr film deposited on the Ru layer with no annealing.
Keyword (in Japanese) (See Japanese page) 
(in English) Collimated sputtering / Inclined deposition / Crystalline orientation / Magnetic recording media / Ta / Pt / anneal /  
Reference Info. IEICE Tech. Rep., vol. 111, Dec. 2011.
Paper #  
Date of Issue 2011-12-08 (MR) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF MR2011-33

Conference Information
Committee MRIS ITE-MMS  
Conference Date 2011-12-15 - 2011-12-16 
Place (in Japanese) (See Japanese page) 
Place (in English) Ehime Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Signal Processing, etc. 
Paper Information
Registration To MRIS 
Conference Code 2011-12-MR-MMS 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Crystalline orientation control of collimated sputtering film 
Sub Title (in English)  
Keyword(1) Collimated sputtering  
Keyword(2) Inclined deposition  
Keyword(3) Crystalline orientation  
Keyword(4) Magnetic recording media  
Keyword(5) Ta  
Keyword(6) Pt  
Keyword(7) anneal  
Keyword(8)  
1st Author's Name Akito Honda  
1st Author's Affiliation Tohoku Institute of Technology (Touhoku Inst. of Tech.)
2nd Author's Name Naoki Honda  
2nd Author's Affiliation Tohoku Institute of Technology (Touhoku Inst. of Tech.)
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Speaker Author-1 
Date Time 2011-12-16 10:00:00 
Presentation Time 30 minutes 
Registration for MRIS 
Paper # MR2011-33 
Volume (vol) vol.111 
Number (no) no.350 
Page pp.57-62 
#Pages 6 
Date of Issue 2011-12-08 (MR) 

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