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Paper Abstract and Keywords
Presentation 2012-04-28 10:50
Control of Grain Growth Using Amorphous Si Strips and Slit Masks Induced by Micro-Thermal-Plasma-Jet Crystallization
Yuji Fujita, Shohei Hayashi, Seiichiro Higashi (Hiroshima Univ.) SDM2012-15 OME2012-15
Abstract (in Japanese) (See Japanese page) 
(in English) Lateral grain growth was induced by micro-thermal-plasma-jet (μ-TPJ) irradiation to slit masks on amorphous silicon (a-Si) films. From a high speed camera observation, a-Si films were solid-phase crystallized and then a oval molten region stretched in a direction perpendicular to the scan direction was formed, followed by a lateral grain growth of 170 μm in length. Such a long growth distance was achieved due to the strong temperature gradient in molten Si formed by slit masks. By μ-TPJ irradiation to slit masks precisely aligned with a-Si strips with the width (W) of 1 ～ 10 μm, filtering effect was confirmed when W was below 3 μm. Single grain growth which have low defects were achieved in Si strips formed by W = 1 μm.
Keyword (in Japanese) (See Japanese page) 
(in English) Micro-Thermal-Plasma-Jet / Slit Mask / Control of Grain Growth / / / / /  
Reference Info. IEICE Tech. Rep., vol. 112, no. 18, SDM2012-15, pp. 67-70, April 2012.
Paper # SDM2012-15 
Date of Issue 2012-04-20 (SDM, OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2012-15 OME2012-15

Conference Information
Committee SDM OME  
Conference Date 2012-04-27 - 2012-04-28 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa-Ken-Seinen-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Advanced Thin-Film Devices (Si, Compound, Organic) and Related Topics 
Paper Information
Registration To SDM 
Conference Code 2012-04-SDM-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Control of Grain Growth Using Amorphous Si Strips and Slit Masks Induced by Micro-Thermal-Plasma-Jet Crystallization 
Sub Title (in English)  
Keyword(1) Micro-Thermal-Plasma-Jet  
Keyword(2) Slit Mask  
Keyword(3) Control of Grain Growth  
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1st Author's Name Yuji Fujita  
1st Author's Affiliation Hirosima University (Hiroshima Univ.)
2nd Author's Name Shohei Hayashi  
2nd Author's Affiliation Hirosima University (Hiroshima Univ.)
3rd Author's Name Seiichiro Higashi  
3rd Author's Affiliation Hirosima University (Hiroshima Univ.)
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Speaker Author-1 
Date Time 2012-04-28 10:50:00 
Presentation Time 20 minutes 
Registration for SDM 
Paper # SDM2012-15, OME2012-15 
Volume (vol) vol.112 
Number (no) no.18(SDM), no.19(OME) 
Page pp.67-70 
#Pages 4 
Date of Issue 2012-04-20 (SDM, OME) 

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