| Paper Abstract and Keywords |
| Presentation |
2012-06-21 15:05
Detection of impurities having various chemical bonding states and their depth profiles in ultra shallow junctions Kazuo Tsutsui, Jun Kanehara, Youhei Miyata (Tokyo Tech.), Hiroshi Nohira (Tokyo City Univ.), Yudai Izumi, Takayuki Muro, Toyohiko Kinoshita (JASRI), Parhat Ahmet, Kuniyuki Kakushima, Takeo Hattori, Hiroshi Iwai (Tokyo Tech.) SDM2012-56 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Depth profiles of impurity having different chemical bonding states were evaluated by using soft x-ray photoelectron spectroscopy and a sub-nm etching technique on Si ultra shallow junctions doped with B and As. A particular chemical bonding state was correlated with electrically activated impurity atoms by combining with Hall effect measurements. Inactivated impurity atoms having different chemical bonding states were speculated to form different kinds of clusters. By performing the photoelectron spectroscopy studies on Si Fin structure at two photoelectron take-off angles the chemical bonding states of impurity atoms on top surfaces and sidewalls of the Fin structure were found to be different with each other. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
ultra shallow junction / impurity profile / electrical activation / chemical bonding state / soft x-ray photoelectron spectroscopy / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 112, no. 92, SDM2012-56, pp. 69-74, June 2012. |
| Paper # |
SDM2012-56 |
| Date of Issue |
2012-06-14 (SDM) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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| Download PDF |
SDM2012-56 |