| Paper Abstract and Keywords |
| Presentation |
2013-05-17 17:00
High-Speed Response of Avalanche photodiode fabricated by 0.18um standard CMOS process Toshiyuki Shimotori, Ryoichi Gyobu, Takeo Maruyama, Koichi Iiyama (Kanazawa Univ.) LQE2013-16 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Si avalanche photodiodes (APDs) with different electrode spacing are fabricated by 0.18 m standard CMOS process, and their frequency response are measured at 0.8 m wavelength region. The structure of the device is based on the n-MOSFET on a p-substrate, and a p-well layer is used as an optical absorption layer, and the structure to cancel the photogenerated carriers generated in the p-substrate are introduced for fast response. For the APD with the electrode spacing of 1 m, the maximum bandwidth of 7 GHz and the gain bandwidth product of 270 GHz are achieved. The capacitance of the APD is measured to be 443 fF, and the corresponding CR-limited bandwidth with 50 load is estimated to be 7.2 GHz, showing the response speed is limited by the CR-limited bandwidth. Since the PAD capacitance is included in the measured capacitance, the capacitance can be decreased and the bandwidth may be increased resultantly with decreasing the PAD size. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Si / avalanche photodiode / standard CMOS process / high speed response / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 113, no. 49, LQE2013-16, pp. 71-74, May 2013. |
| Paper # |
LQE2013-16 |
| Date of Issue |
2013-05-10 (LQE) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
LQE2013-16 |
| Conference Information |
| Committee |
LQE LSJ |
| Conference Date |
2013-05-17 - 2013-05-17 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
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| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
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| Paper Information |
| Registration To |
LQE |
| Conference Code |
2013-05-LQE-LSJ |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
High-Speed Response of Avalanche photodiode fabricated by 0.18um standard CMOS process |
| Sub Title (in English) |
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| Keyword(1) |
Si |
| Keyword(2) |
avalanche photodiode |
| Keyword(3) |
standard CMOS process |
| Keyword(4) |
high speed response |
| Keyword(5) |
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| 1st Author's Name |
Toshiyuki Shimotori |
| 1st Author's Affiliation |
Kanazawa University (Kanazawa Univ.) |
| 2nd Author's Name |
Ryoichi Gyobu |
| 2nd Author's Affiliation |
Kanazawa University (Kanazawa Univ.) |
| 3rd Author's Name |
Takeo Maruyama |
| 3rd Author's Affiliation |
Kanazawa University (Kanazawa Univ.) |
| 4th Author's Name |
Koichi Iiyama |
| 4th Author's Affiliation |
Kanazawa University (Kanazawa Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2013-05-17 17:00:00 |
| Presentation Time |
25 minutes |
| Registration for |
LQE |
| Paper # |
LQE2013-16 |
| Volume (vol) |
vol.113 |
| Number (no) |
no.49 |
| Page |
pp.71-74 |
| #Pages |
4 |
| Date of Issue |
2013-05-10 (LQE) |