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Paper Abstract and Keywords
Presentation 2013-10-25 09:30
Fabrication of titanium oxide using plasma excited atomic layer deposition
Kensaku Kanomata, Hisashi Ohba, Katsuaki Momiyama, Takahiko Suzuki, Bashil Ahmmad, Shigeru Kubota, Kazuhiro Hirahara, Fumihiko Hirose (Yamagata Univ.) CPM2013-102
Abstract (in Japanese) (See Japanese page) 
(in English) Room-temperature atomic layer deposition (ALD) of titanium dioxide is developed using tetrakis(dimethylamino)titanium (TDMAT) and plasma-excited water vapor generated from a remote plasma source. The plasma-excited water vapor is effective in oxidizing the TDMAT-adsorbed TiO2 surface while leaving OH sites on the growing surface at room temperature for further TDMAT adsorption. The growth rate is measured to be 0.157nm/cycle at room temperature. The TDMAT adsorption and its oxidation on TiO2 were investigated by multiple-internal-refraction infrared absorption spectroscopy (MIR-IRAS). We report adsorption and desorption data in order to design TiO2-ALD at room temperature.
Keyword (in Japanese) (See Japanese page) 
(in English) ALD / TDMAT / Plasma-excited H2O / MIR-IRAS / / / /  
Reference Info. IEICE Tech. Rep., vol. 113, no. 268, CPM2013-102, pp. 45-48, Oct. 2013.
Paper # CPM2013-102 
Date of Issue 2013-10-17 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2013-10-24 - 2013-10-25 
Place (in Japanese) (See Japanese page) 
Place (in English) Niigata Univ. Satellite Campus TOKIMEITO 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Preparation of Thin Films, Materials for Physics and Applications, etc. 
Paper Information
Registration To CPM 
Conference Code 2013-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of titanium oxide using plasma excited atomic layer deposition 
Sub Title (in English)  
Keyword(1) ALD  
Keyword(2) TDMAT  
Keyword(3) Plasma-excited H2O  
Keyword(4) MIR-IRAS  
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Keyword(6)  
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1st Author's Name Kensaku Kanomata  
1st Author's Affiliation Yamagata University (Yamagata Univ.)
2nd Author's Name Hisashi Ohba  
2nd Author's Affiliation Yamagata University (Yamagata Univ.)
3rd Author's Name Katsuaki Momiyama  
3rd Author's Affiliation Yamagata University (Yamagata Univ.)
4th Author's Name Takahiko Suzuki  
4th Author's Affiliation Yamagata University (Yamagata Univ.)
5th Author's Name Bashil Ahmmad  
5th Author's Affiliation Yamagata University (Yamagata Univ.)
6th Author's Name Shigeru Kubota  
6th Author's Affiliation Yamagata University (Yamagata Univ.)
7th Author's Name Kazuhiro Hirahara  
7th Author's Affiliation Yamagata University (Yamagata Univ.)
8th Author's Name Fumihiko Hirose  
8th Author's Affiliation Yamagata University (Yamagata Univ.)
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Speaker Author-1 
Date Time 2013-10-25 09:30:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2013-102 
Volume (vol) vol.113 
Number (no) no.268 
Page pp.45-48 
#Pages 4 
Date of Issue 2013-10-17 (CPM) 

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