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Paper Abstract and Keywords
Presentation 2014-02-27 16:10
Seebeck-coefficient control of ultrathin SOI layer and its novel characterization technique
Hiroya Ikeda, Yuhei Suzuki, Kazutoshi Miwa (Shizuoka Univ.), Faiz Salleh (Shizuoka Univ./JSPS) ED2013-137 SDM2013-152
Abstract (in Japanese) (See Japanese page) 
(in English) The enhancement of the thermoelectric performance has been expected by Si nanostrucutres. The Si Seebeck coefficient is strongly ruled by the influence of phonon drag, which, however, is not sufficiently understood yet. In the present study, we discussed on the contribution of phonon drag to the Seebeck coefficient in ultrathin Si-on-insulator (SOI) layer based on the experimental results of the relationship between the Seebeck coefficient and the carrier concentration. The mean free path of phonon drag which contributes to the Seebeck coefficient was found to decrease with increasing the carrier concentration. In addition, with the aim of measuring the Seebeck coefficient of nanometer-scale materials, we developed a novel technique using Kelvin-probe force microscopy (KFM).
Keyword (in Japanese) (See Japanese page) 
(in English) Seebeck coefficient / ultrathin SOI layer / phonon drag / Kelvin-probe force microscopy / / / /  
Reference Info. IEICE Tech. Rep., vol. 113, no. 450, SDM2013-152, pp. 31-35, Feb. 2014.
Paper # SDM2013-152 
Date of Issue 2014-02-20 (ED, SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2013-137 SDM2013-152

Conference Information
Committee ED SDM  
Conference Date 2014-02-27 - 2014-02-28 
Place (in Japanese) (See Japanese page) 
Place (in English) Hokkaido Univ. Centennial Hall 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Functional nanodevices and related technologies 
Paper Information
Registration To SDM 
Conference Code 2014-02-ED-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Seebeck-coefficient control of ultrathin SOI layer and its novel characterization technique 
Sub Title (in English)  
Keyword(1) Seebeck coefficient  
Keyword(2) ultrathin SOI layer  
Keyword(3) phonon drag  
Keyword(4) Kelvin-probe force microscopy  
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1st Author's Name Hiroya Ikeda  
1st Author's Affiliation Shizuoka University (Shizuoka Univ.)
2nd Author's Name Yuhei Suzuki  
2nd Author's Affiliation Shizuoka University (Shizuoka Univ.)
3rd Author's Name Kazutoshi Miwa  
3rd Author's Affiliation Shizuoka University (Shizuoka Univ.)
4th Author's Name Faiz Salleh  
4th Author's Affiliation Shizuoka University/The Japan Society for the Promotion of Science (Shizuoka Univ./JSPS)
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Speaker Author-1 
Date Time 2014-02-27 16:10:00 
Presentation Time 25 minutes 
Registration for SDM 
Paper # ED2013-137, SDM2013-152 
Volume (vol) vol.113 
Number (no) no.449(ED), no.450(SDM) 
Page pp.31-35 
#Pages 5 
Date of Issue 2014-02-20 (ED, SDM) 

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