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| Presentation | 2014-02-27 16:10 Seebeck-coefficient control of ultrathin SOI layer and its novel characterization technique Hiroya Ikeda, Yuhei Suzuki, Kazutoshi Miwa (Shizuoka Univ.), Faiz Salleh (Shizuoka Univ./JSPS)  ED2013-137 SDM2013-152 Link to ES Tech. Rep. Archives: ED2013-137 SDM2013-152 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | The enhancement of the thermoelectric performance has been expected by Si nanostrucutres. The Si Seebeck coefficient is strongly ruled by the influence of phonon drag, which, however, is not sufficiently understood yet. In the present study, we discussed on the contribution of phonon drag to the Seebeck coefficient in ultrathin Si-on-insulator (SOI) layer based on the experimental results of the relationship between the Seebeck coefficient and the carrier concentration. The mean free path of phonon drag which contributes to the Seebeck coefficient was found to decrease with increasing the carrier concentration. In addition, with the aim of measuring the Seebeck coefficient of nanometer-scale materials, we developed a novel technique using Kelvin-probe force microscopy (KFM). | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Seebeck coefficient / ultrathin SOI layer / phonon drag / Kelvin-probe force microscopy / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 113, no. 450, SDM2013-152, pp. 31-35, Feb. 2014. | |
| Paper # | SDM2013-152 | |
| Date of Issue | 2014-02-20 (ED, SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2013-137 SDM2013-152 Link to ES Tech. Rep. Archives: ED2013-137 SDM2013-152 |
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| Conference Information | |
| Committee | ED SDM |
| Conference Date | 2014-02-27 - 2014-02-28 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Hokkaido Univ. Centennial Hall |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Functional nanodevices and related technologies |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2014-02-ED-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Seebeck-coefficient control of ultrathin SOI layer and its novel characterization technique |
| Sub Title (in English) | |
| Keyword(1) | Seebeck coefficient |
| Keyword(2) | ultrathin SOI layer |
| Keyword(3) | phonon drag |
| Keyword(4) | Kelvin-probe force microscopy |
| Keyword(5) | |
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| 1st Author's Name | Hiroya Ikeda |
| 1st Author's Affiliation | Shizuoka University (Shizuoka Univ.) |
| 2nd Author's Name | Yuhei Suzuki |
| 2nd Author's Affiliation | Shizuoka University (Shizuoka Univ.) |
| 3rd Author's Name | Kazutoshi Miwa |
| 3rd Author's Affiliation | Shizuoka University (Shizuoka Univ.) |
| 4th Author's Name | Faiz Salleh |
| 4th Author's Affiliation | Shizuoka University/The Japan Society for the Promotion of Science (Shizuoka Univ./JSPS) |
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| Speaker | Author-1 |
| Date Time | 2014-02-27 16:10:00 |
| Presentation Time | 25 minutes |
| Registration for | SDM |
| Paper # | ED2013-137, SDM2013-152 |
| Volume (vol) | vol.113 |
| Number (no) | no.449(ED), no.450(SDM) |
| Page | pp.31-35 |
| #Pages | 5 |
| Date of Issue | 2014-02-20 (ED, SDM) |
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