Paper Abstract and Keywords |
Presentation |
2014-04-11 10:50
Fabrication of poly-Si TFT with low-temperature process using BLDA Kiyoharu Shimoda, Kouya Sugihara, Kimihiko Imura, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus) SDM2014-14 OME2014-14 Link to ES Tech. Rep. Archives: SDM2014-14 OME2014-14 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Poly-Si TFTs by low cost fabrication process are required on glass as well as on flexible panel. Top-gate-type TFT without ion-implantation was fabricated with ultra-low temperature process below 400℃ using BLDA. Ti was adopted for source and drain. High performance TFTs formed by low cost process are expected on plastic and on flexible sheet using BLDA. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
TFT / Low temperature / Silicon / Crystallization / Laser annealing / / / |
Reference Info. |
IEICE Tech. Rep., vol. 114, no. 1, SDM2014-14, pp. 59-61, April 2014. |
Paper # |
SDM2014-14 |
Date of Issue |
2014-04-03 (SDM, OME) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2014-14 OME2014-14 Link to ES Tech. Rep. Archives: SDM2014-14 OME2014-14 |
Conference Information |
Committee |
SDM OME |
Conference Date |
2014-04-10 - 2014-04-11 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Okinawa-Ken-Seinen-Kaikan Bldg. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Advanced Thin-Film Devices (Si, Compound, Organic) and Related Topics |
Paper Information |
Registration To |
SDM |
Conference Code |
2014-04-SDM-OME |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Fabrication of poly-Si TFT with low-temperature process using BLDA |
Sub Title (in English) |
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Keyword(1) |
TFT |
Keyword(2) |
Low temperature |
Keyword(3) |
Silicon |
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Crystallization |
Keyword(5) |
Laser annealing |
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Keyword(7) |
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1st Author's Name |
Kiyoharu Shimoda |
1st Author's Affiliation |
University of the Ryukyus (Univ. of the Ryukyus) |
2nd Author's Name |
Kouya Sugihara |
2nd Author's Affiliation |
University of the Ryukyus (Univ. of the Ryukyus) |
3rd Author's Name |
Kimihiko Imura |
3rd Author's Affiliation |
University of the Ryukyus (Univ. of the Ryukyus) |
4th Author's Name |
Tatsuya Okada |
4th Author's Affiliation |
University of the Ryukyus (Univ. of the Ryukyus) |
5th Author's Name |
Takashi Noguchi |
5th Author's Affiliation |
University of the Ryukyus (Univ. of the Ryukyus) |
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Speaker |
Author-1 |
Date Time |
2014-04-11 10:50:00 |
Presentation Time |
20 minutes |
Registration for |
SDM |
Paper # |
SDM2014-14, OME2014-14 |
Volume (vol) |
vol.114 |
Number (no) |
no.1(SDM), no.2(OME) |
Page |
pp.59-61 |
#Pages |
3 |
Date of Issue |
2014-04-03 (SDM, OME) |
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