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Paper Abstract and Keywords
Presentation 2014-10-16 16:30
[Invited Talk] Ion Implantation Technologies for Image Sensing Devices
Yoji Kawasaki, Genshu Fuse, Makoto Sano, Emi Ooga, Masazumi Koike, Kazuhiro Watanabe, Michiro Sugitani (SEN Corp.) SDM2014-88
Abstract (in Japanese) (See Japanese page) 
(in English) Some trends of the implantation processing in device fabrication of CMOS image sensors are discussed. Firstly, the variations in beam direction and crystal axis are verified for repeatable dopant profile in ultra-high energy implantation. It is also demonstrated that crystal damage is dependent on the charge density in ion beam. Finally it is suggested that it is effective to utilize additional electrical energy filter and RF-PFG for significant reduction of metal contamination.
Keyword (in Japanese) (See Japanese page) 
(in English) photodiode / high energy implantation / chaining implantation / channeling / angle accuracy, / photoresist / beam scan / metal contamination  
Reference Info. IEICE Tech. Rep., vol. 114, no. 255, SDM2014-88, pp. 23-30, Oct. 2014.
Paper # SDM2014-88 
Date of Issue 2014-10-09 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2014-88

Conference Information
Committee SDM  
Conference Date 2014-10-16 - 2014-10-17 
Place (in Japanese) (See Japanese page) 
Place (in English) Niche, Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2014-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Ion Implantation Technologies for Image Sensing Devices 
Sub Title (in English)  
Keyword(1) photodiode  
Keyword(2) high energy implantation  
Keyword(3) chaining implantation  
Keyword(4) channeling  
Keyword(5) angle accuracy,  
Keyword(6) photoresist  
Keyword(7) beam scan  
Keyword(8) metal contamination  
1st Author's Name Yoji Kawasaki  
1st Author's Affiliation SEN Corporation (SEN Corp.)
2nd Author's Name Genshu Fuse  
2nd Author's Affiliation SEN Corporation (SEN Corp.)
3rd Author's Name Makoto Sano  
3rd Author's Affiliation SEN Corporation (SEN Corp.)
4th Author's Name Emi Ooga  
4th Author's Affiliation SEN Corporation (SEN Corp.)
5th Author's Name Masazumi Koike  
5th Author's Affiliation SEN Corporation (SEN Corp.)
6th Author's Name Kazuhiro Watanabe  
6th Author's Affiliation SEN Corporation (SEN Corp.)
7th Author's Name Michiro Sugitani  
7th Author's Affiliation SEN Corporation (SEN Corp.)
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Speaker Author-1 
Date Time 2014-10-16 16:30:00 
Presentation Time 50 minutes 
Registration for SDM 
Paper # SDM2014-88 
Volume (vol) vol.114 
Number (no) no.255 
Page pp.23-30 
#Pages 8 
Date of Issue 2014-10-09 (SDM) 

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