| Paper Abstract and Keywords |
| Presentation |
2014-12-12 16:30
Interface Characterization of 4H-SiC MOSFETs by Single Pulse Id-Vgs Measurements Kosuke Isono (NAIST), Hiroshi Yano (NAIST/Univ. Tsukuba) EID2014-34 SDM2014-129 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
SiC MOSFETs have suffered from issues such as threshold voltage instability and low channel mobility due to high interface trap density. Generally, Id-Vgs characteristics of MOSFETs are measured by applying DC voltage to the gate electrode. It has been pointed out that the electron trapping at the interface or oxide defects during electrical measurements brings fluctuations in electrical properties. In this work, we evaluated SiC MOS interface properties by using single pulse Id-Vgs measurements, which enable to measure Id-Vgs characteristics during rise and fall times of the single pulse and evaluate the drain current decrement. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
4H-SiC / MOS / interface characterization / single pulse Id-Vgs / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 114, no. 360, SDM2014-129, pp. 109-113, Dec. 2014. |
| Paper # |
SDM2014-129 |
| Date of Issue |
2014-12-05 (EID, SDM) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
EID2014-34 SDM2014-129 |
| Conference Information |
| Committee |
SDM EID |
| Conference Date |
2014-12-12 - 2014-12-12 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Kyoto University |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Si and Si-related Materials and Devices, Display Technology |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2014-12-SDM-EID |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Interface Characterization of 4H-SiC MOSFETs by Single Pulse Id-Vgs Measurements |
| Sub Title (in English) |
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| Keyword(1) |
4H-SiC |
| Keyword(2) |
MOS |
| Keyword(3) |
interface characterization |
| Keyword(4) |
single pulse Id-Vgs |
| Keyword(5) |
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| 1st Author's Name |
Kosuke Isono |
| 1st Author's Affiliation |
Nara Institute of Science and Technology (NAIST) |
| 2nd Author's Name |
Hiroshi Yano |
| 2nd Author's Affiliation |
Nara Institute of Science and Technology/University of Tsukuba (NAIST/Univ. Tsukuba) |
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| Speaker |
Author-1 |
| Date Time |
2014-12-12 16:30:00 |
| Presentation Time |
15 minutes |
| Registration for |
SDM |
| Paper # |
EID2014-34, SDM2014-129 |
| Volume (vol) |
vol.114 |
| Number (no) |
no.359(EID), no.360(SDM) |
| Page |
pp.109-113 |
| #Pages |
5 |
| Date of Issue |
2014-12-05 (EID, SDM) |