Paper Abstract and Keywords |
Presentation |
2014-12-19 16:40
High-speed operation of 1.3 um GaAs/InGaAs metamorphic lasers fabricated by using highly-accurate control of crystal lattice relaxation based on in-situ wafer curvature measurement Ryo Nakao, Masakazu Arai, Wataru Kobayashi, Tsuyoshi Yamamoto, Shinji Matsuo (NTT) OPE2014-150 LQE2014-137 Link to ES Tech. Rep. Archives: OPE2014-150 LQE2014-137 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Metamorphic-growth technology has a potential to overcome the restriction of the lattice matching in the semiconductor device fabrication; this technology enables to construct a high-performance lasers for a data transmission system in telecom and photonics-electronics integrated devices in ICT equipment. In this report, we proposed a new device fabrication method which enables highly-accurate control of crystal lattice relaxation of metamorphic buffer by introducing in-situ wafer curvature measurements during growth. As a result, we successfully achieved a thin InGaAs metamorphic buffer with a low dislocations and small wafer curvature on a GaAs substrate; this buffer enables us to fabricate metamorphic laser diode. We have also confirmed that a prototype laser had a high characteristic temperature (187 K) and a directly modulation of 25 Gbit/s at 1.3 um. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Metamorphic Growth / In-situ Measurement / Direct Modulation / High Temperature Characteristics / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 114, no. 378, LQE2014-137, pp. 59-64, Dec. 2014. |
Paper # |
LQE2014-137 |
Date of Issue |
2014-12-11 (OPE, LQE) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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Download PDF |
OPE2014-150 LQE2014-137 Link to ES Tech. Rep. Archives: OPE2014-150 LQE2014-137 |
Conference Information |
Committee |
OPE LQE |
Conference Date |
2014-12-18 - 2014-12-19 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Kikai-Shinko-Kaikan, NTT Atsugi R&D center |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Optical passive component (filter, connector, MEMS), Semiconductor lasers, Silicon photonics, etc |
Paper Information |
Registration To |
LQE |
Conference Code |
2014-12-OPE-LQE |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
High-speed operation of 1.3 um GaAs/InGaAs metamorphic lasers fabricated by using highly-accurate control of crystal lattice relaxation based on in-situ wafer curvature measurement |
Sub Title (in English) |
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Keyword(1) |
Metamorphic Growth |
Keyword(2) |
In-situ Measurement |
Keyword(3) |
Direct Modulation |
Keyword(4) |
High Temperature Characteristics |
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1st Author's Name |
Ryo Nakao |
1st Author's Affiliation |
Nippon Telegraph and Telephone Corporation (NTT) |
2nd Author's Name |
Masakazu Arai |
2nd Author's Affiliation |
Nippon Telegraph and Telephone Corporation (NTT) |
3rd Author's Name |
Wataru Kobayashi |
3rd Author's Affiliation |
Nippon Telegraph and Telephone Corporation (NTT) |
4th Author's Name |
Tsuyoshi Yamamoto |
4th Author's Affiliation |
Nippon Telegraph and Telephone Corporation (NTT) |
5th Author's Name |
Shinji Matsuo |
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Nippon Telegraph and Telephone Corporation (NTT) |
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Speaker |
Author-1 |
Date Time |
2014-12-19 16:40:00 |
Presentation Time |
25 minutes |
Registration for |
LQE |
Paper # |
OPE2014-150, LQE2014-137 |
Volume (vol) |
vol.114 |
Number (no) |
no.377(OPE), no.378(LQE) |
Page |
pp.59-64 |
#Pages |
6 |
Date of Issue |
2014-12-11 (OPE, LQE) |
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