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Paper Abstract and Keywords
Presentation 2014-12-19 16:40
High-speed operation of 1.3 um GaAs/InGaAs metamorphic lasers fabricated by using highly-accurate control of crystal lattice relaxation based on in-situ wafer curvature measurement
Ryo Nakao, Masakazu Arai, Wataru Kobayashi, Tsuyoshi Yamamoto, Shinji Matsuo (NTT) OPE2014-150 LQE2014-137 Link to ES Tech. Rep. Archives: OPE2014-150 LQE2014-137
Abstract (in Japanese) (See Japanese page) 
(in English) Metamorphic-growth technology has a potential to overcome the restriction of the lattice matching in the semiconductor device fabrication; this technology enables to construct a high-performance lasers for a data transmission system in telecom and photonics-electronics integrated devices in ICT equipment. In this report, we proposed a new device fabrication method which enables highly-accurate control of crystal lattice relaxation of metamorphic buffer by introducing in-situ wafer curvature measurements during growth. As a result, we successfully achieved a thin InGaAs metamorphic buffer with a low dislocations and small wafer curvature on a GaAs substrate; this buffer enables us to fabricate metamorphic laser diode. We have also confirmed that a prototype laser had a high characteristic temperature (187 K) and a directly modulation of 25 Gbit/s at 1.3 um.
Keyword (in Japanese) (See Japanese page) 
(in English) Metamorphic Growth / In-situ Measurement / Direct Modulation / High Temperature Characteristics / / / /  
Reference Info. IEICE Tech. Rep., vol. 114, no. 378, LQE2014-137, pp. 59-64, Dec. 2014.
Paper # LQE2014-137 
Date of Issue 2014-12-11 (OPE, LQE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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Download PDF OPE2014-150 LQE2014-137 Link to ES Tech. Rep. Archives: OPE2014-150 LQE2014-137

Conference Information
Committee OPE LQE  
Conference Date 2014-12-18 - 2014-12-19 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan, NTT Atsugi R&D center 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Optical passive component (filter, connector, MEMS), Semiconductor lasers, Silicon photonics, etc 
Paper Information
Registration To LQE 
Conference Code 2014-12-OPE-LQE 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) High-speed operation of 1.3 um GaAs/InGaAs metamorphic lasers fabricated by using highly-accurate control of crystal lattice relaxation based on in-situ wafer curvature measurement 
Sub Title (in English)  
Keyword(1) Metamorphic Growth  
Keyword(2) In-situ Measurement  
Keyword(3) Direct Modulation  
Keyword(4) High Temperature Characteristics  
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1st Author's Name Ryo Nakao  
1st Author's Affiliation Nippon Telegraph and Telephone Corporation (NTT)
2nd Author's Name Masakazu Arai  
2nd Author's Affiliation Nippon Telegraph and Telephone Corporation (NTT)
3rd Author's Name Wataru Kobayashi  
3rd Author's Affiliation Nippon Telegraph and Telephone Corporation (NTT)
4th Author's Name Tsuyoshi Yamamoto  
4th Author's Affiliation Nippon Telegraph and Telephone Corporation (NTT)
5th Author's Name Shinji Matsuo  
5th Author's Affiliation Nippon Telegraph and Telephone Corporation (NTT)
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Speaker Author-1 
Date Time 2014-12-19 16:40:00 
Presentation Time 25 minutes 
Registration for LQE 
Paper # OPE2014-150, LQE2014-137 
Volume (vol) vol.114 
Number (no) no.377(OPE), no.378(LQE) 
Page pp.59-64 
#Pages
Date of Issue 2014-12-11 (OPE, LQE) 


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