Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2015-04-30 13:00
Grain Growth Control by Atmospheric Pressure Micro-Thermal-Plasma-Jet Irradiation on Amorphous Silicon Strips and High-Speed Operation of CMOS Circuit
Seiji Morisaki, Shohei Hayashi, Shogo Yamamoto, Taichi Nakatani, Seiichiro Higashi (Hiroshima Univ.) SDM2015-13 OME2015-13
Abstract (in Japanese) (See Japanese page) 
(in English) The formation or random grain boundaries was successfully suppressed using grain growth control of high-speed lateral crystallization (HSLC) by micro-thermal-plasma-jet (µ-TPJ) irradiation on1 µm-wide amorphous silicon strips. This strip pattern is quite effective to improve the characteristics of thin film transistors (TFTs). The characteristic variability of TFTs with strip pattern was suppressed to 1/3 compared with conventional pattern. NMOS TFTs achieved field effect mobility of 503 ± 63 cm2V-1s-1, threshold voltage of 1.7 ± 0.06 V and S-factor of 196 ± 15 mV/dec.、152 ± 17 mV/dec. High-speed operation of CMOS circuit was demonstrated . 9-stage ring oscillator with strip pattern was oscillated by 107.5 MHz at supply voltage of 5 V.
Keyword (in Japanese) (See Japanese page) 
(in English) Thermal Plasma Jet / Thin Film Transistor / CMOS / / / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 18, SDM2015-13, pp. 49-52, April 2015.
Paper # SDM2015-13 
Date of Issue 2015-04-22 (SDM, OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2015-13 OME2015-13

Conference Information
Committee OME SDM  
Conference Date 2015-04-29 - 2015-04-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Oh-hama Nobumoto Memorial Hall 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Thin FIlms, Functional Electronics Devices, New Functional Materials and Evaluation, BIomtechnology 
Paper Information
Registration To SDM 
Conference Code 2015-04-OME-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Grain Growth Control by Atmospheric Pressure Micro-Thermal-Plasma-Jet Irradiation on Amorphous Silicon Strips and High-Speed Operation of CMOS Circuit 
Sub Title (in English)  
Keyword(1) Thermal Plasma Jet  
Keyword(2) Thin Film Transistor  
Keyword(3) CMOS  
Keyword(4)  
Keyword(5)  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Seiji Morisaki  
1st Author's Affiliation Hiroshima University (Hiroshima Univ.)
2nd Author's Name Shohei Hayashi  
2nd Author's Affiliation Hiroshima University (Hiroshima Univ.)
3rd Author's Name Shogo Yamamoto  
3rd Author's Affiliation Hiroshima University (Hiroshima Univ.)
4th Author's Name Taichi Nakatani  
4th Author's Affiliation Hiroshima University (Hiroshima Univ.)
5th Author's Name Seiichiro Higashi  
5th Author's Affiliation Hiroshima University (Hiroshima Univ.)
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2015-04-30 13:00:00 
Presentation Time 25 minutes 
Registration for SDM 
Paper # SDM2015-13, OME2015-13 
Volume (vol) vol.115 
Number (no) no.18(SDM), no.19(OME) 
Page pp.49-52 
#Pages 4 
Date of Issue 2015-04-22 (SDM, OME) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan