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Paper Abstract and Keywords
Presentation 2015-08-11 11:40
Effect of surface adsorbate on chemical shifts of core-level spectra for silicon oxinitride film
Takahiro Takami, Makoto Wada, Yoshiharu Enta (Hirosaki Univ.) CPM2015-45
Abstract (in Japanese) (See Japanese page) 
(in English) For silicon oxynitride (SiON) layers formed under specific conditions, unusual core-level spectra, which have large chemical shifts compared with normal spectra for SiON or SiO2 layers, have been observed in XPS measurements. To clarify the origin of the unusual chemical shifts, effects of sample bias and surface adsorbates on the chemical shifts were investigated. When the sample was biased positively, the unusual chemical-shift component moved toward normal value and consequently overlapped with the normal component. Furthermore, when a monolayer of Cs metal was deposited on the surface, the chemical-shift components showed the same behavior as the positively biased sample. Therefore, we consider that the unusual chemical shifts observed in this study are due to partially charged regions in SiON layers.
Keyword (in Japanese) (See Japanese page) 
(in English) Silicon Oxynitride / Core-Level Chemical Shift / Charging / / / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 179, CPM2015-45, pp. 71-74, Aug. 2015.
Paper # CPM2015-45 
Date of Issue 2015-08-03 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2015-45

Conference Information
Committee CPM  
Conference Date 2015-08-10 - 2015-08-11 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2015-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Effect of surface adsorbate on chemical shifts of core-level spectra for silicon oxinitride film 
Sub Title (in English)  
Keyword(1) Silicon Oxynitride  
Keyword(2) Core-Level Chemical Shift  
Keyword(3) Charging  
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1st Author's Name Takahiro Takami  
1st Author's Affiliation Hirosaki University (Hirosaki Univ.)
2nd Author's Name Makoto Wada  
2nd Author's Affiliation Hirosaki University (Hirosaki Univ.)
3rd Author's Name Yoshiharu Enta  
3rd Author's Affiliation Hirosaki University (Hirosaki Univ.)
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Speaker Author-1 
Date Time 2015-08-11 11:40:00 
Presentation Time 20 minutes 
Registration for CPM 
Paper # CPM2015-45 
Volume (vol) vol.115 
Number (no) no.179 
Page pp.71-74 
#Pages 4 
Date of Issue 2015-08-03 (CPM) 

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