Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2016-02-19 13:20
Investigation of Electrical Contacts on a Nanometer Scale using a Nano-manipulator in Scanning Electron Microscope
Jun Toyoizumi, Masanori Onuma, Takaya Kondo, Kikuo Mori (yazaki), Tetsuo Shimizu, Sumiko Kawabata, Norimichi Watanabe (AIST) R2015-65 EMD2015-93
Abstract (in Japanese) (See Japanese page) 
(in English) The indentation using tin oxide film which was deposited on tin substrate was executed by a tungsten probe whose curvature was about 5 micro meter in radius with a nano-manipulator in Scanning Electron Microscope. We measured contact resistance and the load force simultaneously, found cracks of tin oxide layer and tin penetration into the cracks and investigated in detail the correlation between indented surface morphology and electrical resistance characteristics with respect to load force by changing indentation depth. In case of 100 nm oxide film, abrupt electrical resistance decrease was observed by applying load force about 1.0x10-3N. The increase of tin penetration area on indented surface correlated with the abrupt electrical resistance decrease. This directly indicated that tin penetration into the cracks and tin appearances on the oxide surface were crucial phenomena for reliable electrical contact. Nano-manipulator used in this study was a powerful instrument for basic research of electrical contacts and realization of the miniaturized and lower load force connector.
Keyword (in Japanese) (See Japanese page) 
(in English) lectrical contact / nano-indentation manipulator / scanning electron microscope / focused ion beam / / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 455, EMD2015-93, pp. 1-6, Feb. 2016.
Paper # EMD2015-93 
Date of Issue 2016-02-12 (R, EMD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF R2015-65 EMD2015-93

Conference Information
Committee EMD R  
Conference Date 2016-02-19 - 2016-02-19 
Place (in Japanese) (See Japanese page) 
Place (in English) Azarea,Shizuoka 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To EMD 
Conference Code 2016-02-EMD-R 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Investigation of Electrical Contacts on a Nanometer Scale using a Nano-manipulator in Scanning Electron Microscope 
Sub Title (in English)  
Keyword(1) lectrical contact  
Keyword(2) nano-indentation manipulator  
Keyword(3) scanning electron microscope  
Keyword(4) focused ion beam  
Keyword(5)  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Jun Toyoizumi  
1st Author's Affiliation Yazaki Parts CO., LTD (yazaki)
2nd Author's Name Masanori Onuma  
2nd Author's Affiliation Yazaki Parts CO., LTD (yazaki)
3rd Author's Name Takaya Kondo  
3rd Author's Affiliation Yazaki Parts CO., LTD (yazaki)
4th Author's Name Kikuo Mori  
4th Author's Affiliation Yazaki Corporation (yazaki)
5th Author's Name Tetsuo Shimizu  
5th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
6th Author's Name Sumiko Kawabata  
6th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
7th Author's Name Norimichi Watanabe  
7th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2016-02-19 13:20:00 
Presentation Time 25 minutes 
Registration for EMD 
Paper # R2015-65, EMD2015-93 
Volume (vol) vol.115 
Number (no) no.454(R), no.455(EMD) 
Page pp.1-6 
#Pages 6 
Date of Issue 2016-02-12 (R, EMD) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan