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Paper Abstract and Keywords
Presentation 2016-06-29 10:20
[Invited Lecture] Preparation of orientation-controlled HfO2 –based films and their properties
Hiroshi Funakub, Takao Shimizu, Kiriha Katayama, Takanori Mimura (Tokyo Tech.) SDM2016-33
Abstract (in Japanese) (See Japanese page) 
(in English) Ferroelectric epitaxial HfO2-based films were successfully grown on single crystal substrates. Distinguish method of ferroelectric phase with other phases was established by using XRD analysis. Ferroelectric HfO2-based films were grown on various kinds of substrates and their orientation control method was established.
Keyword (in Japanese) (See Japanese page) 
(in English) HfO2-based ferroelectric film / epitaxial films / orientation control / / / / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 118, SDM2016-33, pp. 5-8, June 2016.
Paper # SDM2016-33 
Date of Issue 2016-06-22 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2016-06-29 - 2016-06-29 
Place (in Japanese) (See Japanese page) 
Place (in English) Campus Innovation Center Tokyo 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Material Science and Process Technology for MOS Devices and Memories 
Paper Information
Registration To SDM 
Conference Code 2016-06-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Preparation of orientation-controlled HfO2 –based films and their properties 
Sub Title (in English)  
Keyword(1) HfO2-based ferroelectric film  
Keyword(2) epitaxial films  
Keyword(3) orientation control  
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1st Author's Name Hiroshi Funakub  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo Tech.)
2nd Author's Name Takao Shimizu  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech.)
3rd Author's Name Kiriha Katayama  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech.)
4th Author's Name Takanori Mimura  
4th Author's Affiliation Tokyo Institute of Technology (Tokyo Tech.)
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Speaker Author-1 
Date Time 2016-06-29 10:20:00 
Presentation Time 20 minutes 
Registration for SDM 
Paper # SDM2016-33 
Volume (vol) vol.116 
Number (no) no.118 
Page pp.5-8 
#Pages 4 
Date of Issue 2016-06-22 (SDM) 

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