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Paper Abstract and Keywords
Presentation 2016-11-16 15:00
Structural Change Detection in Lithography Systems
Yosuke Otsubo (NIKON), Masashi Sugiyama (RIKEN/UTokyo) IBISML2016-45
Abstract (in Japanese) (See Japanese page) 
(in English) A lithography system, which consists of various mechanical units such as high-precision optical systems, prints circuit patterns on a silicon wafer. To achieve high throughput and nanometer-order alignment accuracy, it is
necessary to accurately grasp change of internal states in the system which sensitively depends on environments and exposure conditions. For this purpose, it is useful to install many sensors in the system to measure its internal states and detect change in the statistical dependency among sensors. However, naive change detection by first estimating the statistical dependency among sensors at each time point and then comparing the estimated dependency does not work well due to measurement noise. To cope with this problem, we adopt a direct structural change detection method that has been developed recently based on density ratio estimation. This method directly estimates change in statistical dependency without identifying the statistical dependency at each time point. In this paper, we further propose to use group regularization to incorporate our prior knowledge on the module structure of the system. We apply the proposed method to sensor-log data obtained from an actual lithography system and show that natural results can be obtained that are consistent with the mechanical and physical structure of the system.
Keyword (in Japanese) (See Japanese page) 
(in English) Lithography system / Structural change detection / Sensor log / Density ratio estimation / group regularization / / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 300, IBISML2016-45, pp. 1-8, Nov. 2016.
Paper # IBISML2016-45 
Date of Issue 2016-11-09 (IBISML) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee IBISML  
Conference Date 2016-11-16 - 2016-11-18 
Place (in Japanese) (See Japanese page) 
Place (in English) Kyoto Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Information-Based Induction Science Workshop (IBIS2016) 
Paper Information
Registration To IBISML 
Conference Code 2016-11-IBISML 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Structural Change Detection in Lithography Systems 
Sub Title (in English)  
Keyword(1) Lithography system  
Keyword(2) Structural change detection  
Keyword(3) Sensor log  
Keyword(4) Density ratio estimation  
Keyword(5) group regularization  
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1st Author's Name Yosuke Otsubo  
1st Author's Affiliation NIKON CORPORATION (NIKON)
2nd Author's Name Masashi Sugiyama  
2nd Author's Affiliation RIKEN/The University of Tokyo (RIKEN/UTokyo)
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Speaker Author-1 
Date Time 2016-11-16 15:00:00 
Presentation Time 180 minutes 
Registration for IBISML 
Paper # IBISML2016-45 
Volume (vol) vol.116 
Number (no) no.300 
Page pp.1-8 
#Pages 8 
Date of Issue 2016-11-09 (IBISML) 

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