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Paper Abstract and Keywords
Presentation 2016-12-09 10:30
Sputter-deposition of inclined anisotropy film with Co/Pt atomic layer stacking
Naoki Honda (Tohoku Inst. Tech.), Shintaro Hinata, Shin Saito (Tohoku Univ.) MR2016-38
Abstract (in Japanese) (See Japanese page) 
(in English) Deposition of weakly inclined anisotropy film for bit-patterned media was studied. First, deposition of Co/Pt layer stacking film with high perpendicular anisotropy and saturation magnetization was investigated by room temperature co-sputtering of Co and Pt with rotating substrate holder. A film with a high perpendicular anisotropy of 1×107 erg/cm3 and saturation magnetization of 600 emu/cm3 was obtained when a high deposition Ar pressure of 4.8 Pa and 3 mono-layer stacking of Co and 2 mono-layer stacking of Pt were adopted. The obtained Co/Pt film was applied to deposit inclined anisotropy film using tilted collimator sputtering. Inclination of anisotropy axis of around 8˚ with a high perpendicular coercivity of around 5 kOe was obtained. The result suggested possibility to make a bit-patterned media for high recording densities.
Keyword (in Japanese) (See Japanese page) 
(in English) Co/Pt layer stacking film / Sputter-deposition with rotating substrate holder / High Ar pressure deposition / Stacking layer thickness dependence / High magnetic anisotropy film / Inclined anisotropy film / /  
Reference Info. IEICE Tech. Rep., vol. 116, Dec. 2016.
Paper #  
Date of Issue 2016-12-01 (MR) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF MR2016-38

Conference Information
Committee MRIS ITE-MMS  
Conference Date 2016-12-08 - 2016-12-09 
Place (in Japanese) (See Japanese page) 
Place (in English) Ehime Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Signal Processing, etc. 
Paper Information
Registration To MRIS 
Conference Code 2016-12-MR-MMS 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Sputter-deposition of inclined anisotropy film with Co/Pt atomic layer stacking 
Sub Title (in English)  
Keyword(1) Co/Pt layer stacking film  
Keyword(2) Sputter-deposition with rotating substrate holder  
Keyword(3) High Ar pressure deposition  
Keyword(4) Stacking layer thickness dependence  
Keyword(5) High magnetic anisotropy film  
Keyword(6) Inclined anisotropy film  
Keyword(7)  
Keyword(8)  
1st Author's Name Naoki Honda  
1st Author's Affiliation Tohoku Institute of Technology (Tohoku Inst. Tech.)
2nd Author's Name Shintaro Hinata  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Shin Saito  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
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Speaker Author-1 
Date Time 2016-12-09 10:30:00 
Presentation Time 25 minutes 
Registration for MRIS 
Paper # MR2016-38 
Volume (vol) vol.116 
Number (no) no.348 
Page pp.51-56 
#Pages 6 
Date of Issue 2016-12-01 (MR) 

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