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Paper Abstract and Keywords
Presentation 2017-04-21 10:00
Plasma fusion CMP® technology for GaN substrates -- Evaluation of processing characteristics for plasma fusion CMP® using Ar plasma and ethanol bubbling --
Naoki Yamazaki (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Toshiro Doi (Kyushu Univ), Hideo Aida (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Seongwoo Kim, Koki Oyama (Namiki PrecisionJewel Co.,LTD), Shuhei Kurokawa (Kyushu Univ), Yasuhisa Sano (Osaka Univ.), Masaharu Shiratani, Yoko Yamanishi (Kyushu Univ) SDM2017-5 OME2017-5
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
Keyword (in Japanese) (See Japanese page) 
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Reference Info. IEICE Tech. Rep., vol. 117, no. 8, OME2017-5, pp. 19-23, April 2017.
Paper # OME2017-5 
Date of Issue 2017-04-13 (SDM, OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2017-5 OME2017-5

Conference Information
Committee OME SDM  
Conference Date 2017-04-20 - 2017-04-21 
Place (in Japanese) (See Japanese page) 
Place (in English) Tatsugochou Shougaigakushuu Center 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Organic molecular devices, silicon device, biotechnology, thin film device, novel material, evaluation method, etc 
Paper Information
Registration To OME 
Conference Code 2017-04-OME-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Plasma fusion CMP® technology for GaN substrates 
Sub Title (in English) Evaluation of processing characteristics for plasma fusion CMP® using Ar plasma and ethanol bubbling 
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1st Author's Name Naoki Yamazaki  
1st Author's Affiliation Kyushu University/Namiki PrecisionJewel Co.,LTD (Kyushu Univ./Namiki PrecisionJewel Co.,LTD)
2nd Author's Name Toshiro Doi  
2nd Author's Affiliation Kyushu University (Kyushu Univ)
3rd Author's Name Hideo Aida  
3rd Author's Affiliation Kyushu University/Namiki PrecisionJewel Co.,LTD (Kyushu Univ./Namiki PrecisionJewel Co.,LTD)
4th Author's Name Seongwoo Kim  
4th Author's Affiliation Namiki PrecisionJewel Co.,LTD (Namiki PrecisionJewel Co.,LTD)
5th Author's Name Koki Oyama  
5th Author's Affiliation Namiki PrecisionJewel Co.,LTD (Namiki PrecisionJewel Co.,LTD)
6th Author's Name Shuhei Kurokawa  
6th Author's Affiliation Kyushu University (Kyushu Univ)
7th Author's Name Yasuhisa Sano  
7th Author's Affiliation Osaka University (Osaka Univ.)
8th Author's Name Masaharu Shiratani  
8th Author's Affiliation Kyushu University (Kyushu Univ)
9th Author's Name Yoko Yamanishi  
9th Author's Affiliation Kyushu University (Kyushu Univ)
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Speaker Author-1 
Date Time 2017-04-21 10:00:00 
Presentation Time 25 minutes 
Registration for OME 
Paper # SDM2017-5, OME2017-5 
Volume (vol) vol.117 
Number (no) no.7(SDM), no.8(OME) 
Page pp.19-23 
#Pages 5 
Date of Issue 2017-04-13 (SDM, OME) 

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