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Paper Abstract and Keywords
Presentation 2017-07-22 11:33
[Invited Talk] Development of Low Damage Facing Target Sputter-deposition Processes
Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2017-38
Abstract (in Japanese) (See Japanese page) 
(in English) About 43 years ago, I firstly challenged the deposition of YIG films by using a conventional sputtering system. Deposition of stoichiometric YIG films was a difficult challenge since high energy negative oxygen ions and secondary electrons emitted from target surface bombard the substrate surface during deposition. In order to realize high rate sputter-deposition of YIG film, I studied sputtering phenomena and invented Facing-Target sputtering method in which substrate bombardment of negative oxygen ions and secondary electrons were completely suppressed. Recently, low damage sputter-deposition process using the Facing-Target sputtering method has been developed for organic devices. In this paper, history of the low damage sputter-deposition process for the formation of top electrode films in OLED will be explained.
Keyword (in Japanese) (See Japanese page) 
(in English) Facing-Traget sputtering / negative oxygen ion / secondary electron / OLED / / low damage sputtering / /  
Reference Info. IEICE Tech. Rep., vol. 117, no. 148, CPM2017-38, pp. 89-94, July 2017.
Paper # CPM2017-38 
Date of Issue 2017-07-14 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2017-38

Conference Information
Committee CPM  
Conference Date 2017-07-21 - 2017-07-22 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2017-07-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Development of Low Damage Facing Target Sputter-deposition Processes 
Sub Title (in English)  
Keyword(1) Facing-Traget sputtering  
Keyword(2) negative oxygen ion  
Keyword(3) secondary electron  
Keyword(4) OLED  
Keyword(5)  
Keyword(6) low damage sputtering  
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Keyword(8)  
1st Author's Name Yoichi Hoshi  
1st Author's Affiliation Tokyo Polytechnic University (Tokyo Polytechnic Univ.)
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Speaker Author-1 
Date Time 2017-07-22 11:33:00 
Presentation Time 40 minutes 
Registration for CPM 
Paper # CPM2017-38 
Volume (vol) vol.117 
Number (no) no.148 
Page pp.89-94 
#Pages 6 
Date of Issue 2017-07-14 (CPM) 

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