| Paper Abstract and Keywords |
| Presentation |
2017-11-09 13:05
Simple and efficient approach to improve hot carrier immunity of a p-LDMOSFET Atsushi Sakai, Katsumi Eikyu (REL), Fujii Hiroki, Takahiro Mori (RSMC), Yutaka Akiyama, Yasuo Yamaguchi (REL) SDM2017-63 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
This paper proposes a simple and efficient method to improve hot carrier (HC) immunity of p-channel LDMOSFET without degrading typical figure of merits uch as breakdown voltage $BV$ and specific on-resistance $R_{sp}$.
The superiority of a novel STI-based p-channel LDMOSFET with a hot electron cooling (HEC) layer against the conventional method to improve HC immunity (i.e. extending the p- drift length) is confirmed by TCAD simulation. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
p-LDMOSFET / hot carrier stress / gate oxide breakdown / / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 117, no. 290, SDM2017-63, pp. 11-14, Nov. 2017. |
| Paper # |
SDM2017-63 |
| Date of Issue |
2017-11-02 (SDM) |
| ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
SDM2017-63 |
| Conference Information |
| Committee |
SDM |
| Conference Date |
2017-11-09 - 2017-11-10 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Kikai-Shinko-Kaikan Bldg. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Process, Device, Circuit simulation, etc. |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2017-11-SDM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Simple and efficient approach to improve hot carrier immunity of a p-LDMOSFET |
| Sub Title (in English) |
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| Keyword(1) |
p-LDMOSFET |
| Keyword(2) |
hot carrier stress |
| Keyword(3) |
gate oxide breakdown |
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| 1st Author's Name |
Atsushi Sakai |
| 1st Author's Affiliation |
Renesas Electronics (REL) |
| 2nd Author's Name |
Katsumi Eikyu |
| 2nd Author's Affiliation |
Renesas Electronics (REL) |
| 3rd Author's Name |
Fujii Hiroki |
| 3rd Author's Affiliation |
Renesas Semiconductor Manufacturing (RSMC) |
| 4th Author's Name |
Takahiro Mori |
| 4th Author's Affiliation |
Renesas Semiconductor Manufacturing (RSMC) |
| 5th Author's Name |
Yutaka Akiyama |
| 5th Author's Affiliation |
Renesas Electronics (REL) |
| 6th Author's Name |
Yasuo Yamaguchi |
| 6th Author's Affiliation |
Renesas Electronics (REL) |
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| Speaker |
Author-1 |
| Date Time |
2017-11-09 13:05:00 |
| Presentation Time |
25 minutes |
| Registration for |
SDM |
| Paper # |
SDM2017-63 |
| Volume (vol) |
vol.117 |
| Number (no) |
no.290 |
| Page |
pp.11-14 |
| #Pages |
4 |
| Date of Issue |
2017-11-02 (SDM) |