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Paper Abstract and Keywords
Presentation 2017-12-01 09:20
High efficiency processing and its processing mechanism of large area diamond substrate due to plasma fusion CMP
Hidetoshi Takeda (Namiki Precision Jewel Co., Ltd.), Toshiro Doi (Kyushu Univ.), Seong Woo Kim (Namiki Precision Jewel Co., Ltd.), Hideo Aida (Nagaoka Univ. Tech.), Masaharu Shiratani (Kyushu Univ.) OME2017-35
Abstract (in Japanese) (See Japanese page) 
(in English) SiC, GaN and Diamond are known as next generation semiconductor materials, but on the other hand, these are known as ultra hard processing materials in CMP process.
Our research was applying plasma fusion CMP system to these materials and investigating its processing characteristics.
In this paper, we reported processing result of own products of diamond single crystal larger than commercial goods using plasma fusion CMP.
Keyword (in Japanese) (See Japanese page) 
(in English) plasma fusion CMP / P-CVM / CMP / Diamond / Glow discharge / / /  
Reference Info. IEICE Tech. Rep., vol. 117, no. 334, OME2017-35, pp. 1-6, Dec. 2017.
Paper # OME2017-35 
Date of Issue 2017-11-24 (OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee OME  
Conference Date 2017-12-01 - 2017-12-01 
Place (in Japanese) (See Japanese page) 
Place (in English) Sun Messe Tosu 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Organic molecular devices, biotechnology, thin film, novel material, evaluation method, etc 
Paper Information
Registration To OME 
Conference Code 2017-12-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) High efficiency processing and its processing mechanism of large area diamond substrate due to plasma fusion CMP 
Sub Title (in English)  
Keyword(1) plasma fusion CMP  
Keyword(2) P-CVM  
Keyword(3) CMP  
Keyword(4) Diamond  
Keyword(5) Glow discharge  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Hidetoshi Takeda  
1st Author's Affiliation Namiki Precision Jewel Co., Ltd. (Namiki Precision Jewel Co., Ltd.)
2nd Author's Name Toshiro Doi  
2nd Author's Affiliation GIC, Kyushu University (Kyushu Univ.)
3rd Author's Name Seong Woo Kim  
3rd Author's Affiliation Namiki Precision Jewel Co., Ltd. (Namiki Precision Jewel Co., Ltd.)
4th Author's Name Hideo Aida  
4th Author's Affiliation Nagaoka University of Technology (Nagaoka Univ. Tech.)
5th Author's Name Masaharu Shiratani  
5th Author's Affiliation Kyushu University (Kyushu Univ.)
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Speaker Author-1 
Date Time 2017-12-01 09:20:00 
Presentation Time 20 minutes 
Registration for OME 
Paper # OME2017-35 
Volume (vol) vol.117 
Number (no) no.334 
Page pp.1-6 
#Pages 6 
Date of Issue 2017-11-24 (OME) 

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