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Paper Abstract and Keywords
Presentation 2018-10-24 14:25
Effects of discharge gas species (Ar, Kr) on fabrication of Spindt type emitter cathode using high power pulsed magnetron sputtering
Hyuga Taniguchi, Kei Oya, Takeo Nakano (Seikei Univ.), Masayoshi Nagao, Hisashi Ohsaki, Katsuhisa Murakami (AIST) ED2018-27
Abstract (in Japanese) (See Japanese page) 
(in English) Spindt-type emitter is one of the vacuum electron sources prepared by semiconductor manufacturing technologies. On its fabrication, microcavities with a hole on their ceiling are prepared on a Si substrate, and an emitter material (e.g. Mo) is deposited through the hole inside of the cavity. Conventionally, the emitter cathode material has been deposited by using vacuum evaporation. This method, however, has difficulties in large area manufacturing and requires substrate heating to alleviate the tensile stress in the deposited films. In this study, we applied a high power pulsed magnetron sputtering (HPPMS) technique which can ionize the depositing particles and can control their direction and incidence energy. We have demonstrated the Mo emitter preparation at room temperature, but the reversed (compressive) stress frequently resulted in the delamination of the coatings and hindered the stable production of the device. In this study, we used Kr as a discharge gas to suppress the compressive stress of Mo films and compared the results with those prepared by conventional Ar gases. In addition, we applied various negative substrate voltages and investigated its effect on the film stress and the emitter structure.
Keyword (in Japanese) (See Japanese page) 
(in English) Spindt-type emitter / HPPMS / Substrate voltage / Internal stress / / / /  
Reference Info. IEICE Tech. Rep., vol. 118, no. 263, ED2018-27, pp. 5-8, Oct. 2018.
Paper # ED2018-27 
Date of Issue 2018-10-17 (ED) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee ED  
Conference Date 2018-10-24 - 2018-10-24 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To ED 
Conference Code 2018-10-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Effects of discharge gas species (Ar, Kr) on fabrication of Spindt type emitter cathode using high power pulsed magnetron sputtering 
Sub Title (in English)  
Keyword(1) Spindt-type emitter  
Keyword(2) HPPMS  
Keyword(3) Substrate voltage  
Keyword(4) Internal stress  
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1st Author's Name Hyuga Taniguchi  
1st Author's Affiliation Seikei University (Seikei Univ.)
2nd Author's Name Kei Oya  
2nd Author's Affiliation Seikei University (Seikei Univ.)
3rd Author's Name Takeo Nakano  
3rd Author's Affiliation Seikei University (Seikei Univ.)
4th Author's Name Masayoshi Nagao  
4th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
5th Author's Name Hisashi Ohsaki  
5th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
6th Author's Name Katsuhisa Murakami  
6th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
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Speaker Author-1 
Date Time 2018-10-24 14:25:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2018-27 
Volume (vol) vol.118 
Number (no) no.263 
Page pp.5-8 
#Pages 4 
Date of Issue 2018-10-17 (ED) 

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