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Paper Abstract and Keywords
Presentation 2019-11-08 09:30
[Invited Talk] Device Simulation of Dynamic Behavior of Ferroelectric Field-Effect Transistors
Junichi Hattori, Tsutomu Ikegami, Koichi Fukuda, Hiroyuki Ota, Shinji Migita, Hidehiro Asai (AIST) SDM2019-74 Link to ES Tech. Rep. Archives: SDM2019-74
Abstract (in Japanese) (See Japanese page) 
(in English) We propose a method to simulate the dynamic behavior of field-effect transistors (FETs) having ferroelectric materials in the gate stack and harnessing their ferroelectricity within the standard framework of device simulation. This method enables a device simulator to solve the Landau-Khalatnikov equation describing the behavior of the polarization in ferroelectric materials together with the other equations governing FETs such as Poisson's equation. We incorporate this method into our original homemade device simulator and realize the simulation of FETs harnessing the negative capacitance of ferroelectric materials.
Keyword (in Japanese) (See Japanese page) 
(in English) ferroelectrics / negative capacitance / field-effect transistors / device simulation / TCAD / / /  
Reference Info. IEICE Tech. Rep., vol. 119, no. 273, SDM2019-74, pp. 27-32, Nov. 2019.
Paper # SDM2019-74 
Date of Issue 2019-10-31 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2019-74 Link to ES Tech. Rep. Archives: SDM2019-74

Conference Information
Committee SDM  
Conference Date 2019-11-07 - 2019-11-08 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process, Device, Circuit simulation, etc. 
Paper Information
Registration To SDM 
Conference Code 2019-11-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Device Simulation of Dynamic Behavior of Ferroelectric Field-Effect Transistors 
Sub Title (in English)  
Keyword(1) ferroelectrics  
Keyword(2) negative capacitance  
Keyword(3) field-effect transistors  
Keyword(4) device simulation  
Keyword(5) TCAD  
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1st Author's Name Junichi Hattori  
1st Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
2nd Author's Name Tsutomu Ikegami  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
3rd Author's Name Koichi Fukuda  
3rd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
4th Author's Name Hiroyuki Ota  
4th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
5th Author's Name Shinji Migita  
5th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
6th Author's Name Hidehiro Asai  
6th Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
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Speaker Author-1 
Date Time 2019-11-08 09:30:00 
Presentation Time 60 minutes 
Registration for SDM 
Paper # SDM2019-74 
Volume (vol) vol.119 
Number (no) no.273 
Page pp.27-32 
#Pages
Date of Issue 2019-10-31 (SDM) 


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