Paper Abstract and Keywords |
Presentation |
2019-11-08 09:30
[Invited Talk]
Device Simulation of Dynamic Behavior of Ferroelectric Field-Effect Transistors Junichi Hattori, Tsutomu Ikegami, Koichi Fukuda, Hiroyuki Ota, Shinji Migita, Hidehiro Asai (AIST) SDM2019-74 Link to ES Tech. Rep. Archives: SDM2019-74 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We propose a method to simulate the dynamic behavior of field-effect transistors (FETs) having ferroelectric materials in the gate stack and harnessing their ferroelectricity within the standard framework of device simulation. This method enables a device simulator to solve the Landau-Khalatnikov equation describing the behavior of the polarization in ferroelectric materials together with the other equations governing FETs such as Poisson's equation. We incorporate this method into our original homemade device simulator and realize the simulation of FETs harnessing the negative capacitance of ferroelectric materials. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
ferroelectrics / negative capacitance / field-effect transistors / device simulation / TCAD / / / |
Reference Info. |
IEICE Tech. Rep., vol. 119, no. 273, SDM2019-74, pp. 27-32, Nov. 2019. |
Paper # |
SDM2019-74 |
Date of Issue |
2019-10-31 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2019-74 Link to ES Tech. Rep. Archives: SDM2019-74 |