| Paper Abstract and Keywords |
| Presentation |
2020-11-26 14:40
Two-Dimensional Characterization of n-GaN Schottky Contacts Printed by Using Ni Nanoink Yuto Kawasumi, Yuto Yasui (Univ. of Fukui), Yukiyasu Kashiwagi, Toshiyuki Tamai (ORIST), Kenji Shiojima (Univ. of Fukui) ED2020-10 CPM2020-31 LQE2020-61 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Two-dimensional characterization of n-GaN Schottky contacts formed by printing method using Ni nanoink was performed by scanning internal photoemission microscopy (SIPM). The sample annealed at 400 ℃ showed a large series resistance and nonuniformity over the electrode. The sample annealed at 500 ℃ obtained better I-V characteristics with a large q$phi$B value of 1.21 eV, a small n-value of 1.13 and better uniformity. However, when annealing temperature increased to 600 ℃, the I-V characteristics became leaky due to the interfacial reaction between Ni and GaN. The q$phi$B value obtained in this study was comparable with that a conventional evaporated Ni contact, and SIPM indicated that the printing method using nanoink is a candidate to form Schottky contacts on n-GaN. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
GaN / Schottky contact / printed electronics / scanning internal photoemission microscopy / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 120, no. 254, ED2020-10, pp. 37-40, Nov. 2020. |
| Paper # |
ED2020-10 |
| Date of Issue |
2020-11-19 (ED, CPM, LQE) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2020-10 CPM2020-31 LQE2020-61 |
| Conference Information |
| Committee |
LQE CPM ED |
| Conference Date |
2020-11-26 - 2020-11-27 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Online |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
|
| Paper Information |
| Registration To |
ED |
| Conference Code |
2020-11-LQE-CPM-ED |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Two-Dimensional Characterization of n-GaN Schottky Contacts Printed by Using Ni Nanoink |
| Sub Title (in English) |
|
| Keyword(1) |
GaN |
| Keyword(2) |
Schottky contact |
| Keyword(3) |
printed electronics |
| Keyword(4) |
scanning internal photoemission microscopy |
| Keyword(5) |
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| Keyword(6) |
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| Keyword(7) |
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| 1st Author's Name |
Yuto Kawasumi |
| 1st Author's Affiliation |
University of Fukui (Univ. of Fukui) |
| 2nd Author's Name |
Yuto Yasui |
| 2nd Author's Affiliation |
University of Fukui (Univ. of Fukui) |
| 3rd Author's Name |
Yukiyasu Kashiwagi |
| 3rd Author's Affiliation |
Osaka Research Institute of Industrial Science and Technology (ORIST) |
| 4th Author's Name |
Toshiyuki Tamai |
| 4th Author's Affiliation |
Osaka Research Institute of Industrial Science and Technology (ORIST) |
| 5th Author's Name |
Kenji Shiojima |
| 5th Author's Affiliation |
University of Fukui (Univ. of Fukui) |
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| Speaker |
Author-1 |
| Date Time |
2020-11-26 14:40:00 |
| Presentation Time |
20 minutes |
| Registration for |
ED |
| Paper # |
ED2020-10, CPM2020-31, LQE2020-61 |
| Volume (vol) |
vol.120 |
| Number (no) |
no.254(ED), no.255(CPM), no.256(LQE) |
| Page |
pp.37-40 |
| #Pages |
4 |
| Date of Issue |
2020-11-19 (ED, CPM, LQE) |