Paper Abstract and Keywords |
Presentation |
2020-11-27 15:20
MOVPE Growth on Low-dislocation-density AlN Templates with Nano-Striped Patterns and Crystalline-Quality Evaluations Yukino Iba, Kanako Shojiki, Shigeyuki Kuboya, Kenjiro Uesugi, Shiyu Xiao, Hideto Miyake (Mie Univ.) ED2020-24 CPM2020-45 LQE2020-75 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We conducted metalorganic vapor phase epitaxial (MOVPE) growth of AlN films on face-to-face annealed sputtered AlN templates (FFA Sp-AlN) having nano-striped pattern. Then, the effect of the MOVPE growth conditions for the crystallinity was elucidated. As a result, it was found that the atomically flat surface of AlN can be achieved with V/III ratio of 221 and growth-rate of above 2.3 µm/hr on nano-patterned FFA Sp-AlN. In addition, the high growth temperature (Tg) of 1300oC enhanced the lateral growth, and the threading dislocation density (TDD) was estimated to be 6.0×108 cm−2. This value proved that AlN films on nano-patterned FFA Sp-AlN templates with low TDDs were achieved with the appropriate MOVPE growth conditions. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
MOVPE / Sputtering / Nano-Patterned Substrate / Threading Dislocation Density / AlN / / / |
Reference Info. |
IEICE Tech. Rep., vol. 120, no. 256, LQE2020-75, pp. 91-94, Nov. 2020. |
Paper # |
LQE2020-75 |
Date of Issue |
2020-11-19 (ED, CPM, LQE) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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ED2020-24 CPM2020-45 LQE2020-75 |
Conference Information |
Committee |
LQE CPM ED |
Conference Date |
2020-11-26 - 2020-11-27 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Online |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
|
Paper Information |
Registration To |
LQE |
Conference Code |
2020-11-LQE-CPM-ED |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
MOVPE Growth on Low-dislocation-density AlN Templates with Nano-Striped Patterns and Crystalline-Quality Evaluations |
Sub Title (in English) |
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Keyword(1) |
MOVPE |
Keyword(2) |
Sputtering |
Keyword(3) |
Nano-Patterned Substrate |
Keyword(4) |
Threading Dislocation Density |
Keyword(5) |
AlN |
Keyword(6) |
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Keyword(7) |
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1st Author's Name |
Yukino Iba |
1st Author's Affiliation |
Mie University (Mie Univ.) |
2nd Author's Name |
Kanako Shojiki |
2nd Author's Affiliation |
Mie University (Mie Univ.) |
3rd Author's Name |
Shigeyuki Kuboya |
3rd Author's Affiliation |
Mie University (Mie Univ.) |
4th Author's Name |
Kenjiro Uesugi |
4th Author's Affiliation |
Mie University (Mie Univ.) |
5th Author's Name |
Shiyu Xiao |
5th Author's Affiliation |
Mie University (Mie Univ.) |
6th Author's Name |
Hideto Miyake |
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Mie University (Mie Univ.) |
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Speaker |
Author-1 |
Date Time |
2020-11-27 15:20:00 |
Presentation Time |
20 minutes |
Registration for |
LQE |
Paper # |
ED2020-24, CPM2020-45, LQE2020-75 |
Volume (vol) |
vol.120 |
Number (no) |
no.254(ED), no.255(CPM), no.256(LQE) |
Page |
pp.91-94 |
#Pages |
4 |
Date of Issue |
2020-11-19 (ED, CPM, LQE) |