Paper Abstract and Keywords |
Presentation |
2021-12-02 15:10
An Improved Method of Layout Pattern Classification with Creating Representative Clip Tomoya Masutani, Ishino Shuhei, Kunihiro Fujiyoshi (TUAT) VLD2021-44 ICD2021-54 DC2021-50 RECONF2021-52 Link to ES Tech. Rep. Archives: ICD2021-54 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Layout of VLSI is designed according to design rules, however, hotspots may remain due to feature size shrinking. Recently, we proposed a method of grouping layout clips of hotspots according to the similarity to create library, which will be used to detect hotspots from new layout. The grouping of layout clips is called Layout Pattern Classification. In this paper, we propose a method of Layout Pattern Classification considering representative clip creation in order to decrease the number of groups. Experimental results indicate the effectiveness of the proposed method. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Layout Pattern Classification / Clustering / / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 121, no. 277, VLD2021-44, pp. 156-161, Dec. 2021. |
Paper # |
VLD2021-44 |
Date of Issue |
2021-11-24 (VLD, ICD, DC, RECONF) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
VLD2021-44 ICD2021-54 DC2021-50 RECONF2021-52 Link to ES Tech. Rep. Archives: ICD2021-54 |
Conference Information |
Committee |
VLD DC RECONF ICD IPSJ-SLDM |
Conference Date |
2021-12-01 - 2021-12-02 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Online |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Design Gaia 2021 -New Field of VLSI Design- |
Paper Information |
Registration To |
VLD |
Conference Code |
2021-12-VLD-DC-RECONF-ICD-SLDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
An Improved Method of Layout Pattern Classification with Creating Representative Clip |
Sub Title (in English) |
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Layout Pattern Classification |
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Clustering |
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1st Author's Name |
Tomoya Masutani |
1st Author's Affiliation |
Tokyo University of Agriculture and Technology (TUAT) |
2nd Author's Name |
Ishino Shuhei |
2nd Author's Affiliation |
Tokyo University of Agriculture and Technology (TUAT) |
3rd Author's Name |
Kunihiro Fujiyoshi |
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Tokyo University of Agriculture and Technology (TUAT) |
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Speaker |
Author-1 |
Date Time |
2021-12-02 15:10:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2021-44, ICD2021-54, DC2021-50, RECONF2021-52 |
Volume (vol) |
vol.121 |
Number (no) |
no.277(VLD), no.278(ICD), no.279(DC), no.280(RECONF) |
Page |
pp.156-161 |
#Pages |
6 |
Date of Issue |
2021-11-24 (VLD, ICD, DC, RECONF) |
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