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| Presentation | 2022-12-22 16:50 [Poster Presentation] Sputter epitaxial LiNbO3 film shear mode thin film resonators Shinya Kudo (Wseda Univ.), Takahiko Yanagitani (Waseda Univ.)  US2022-66 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | LiNbO3 have been used for the SAW filters because of their high Q and k. However, LiNbO3 filter have not used in the BAW industry because thickness extensional mode kt2 in the c-axis oriented LiNbO3, which can be grown in the standard sputtering process, is significantly low compared with quasi-shear mode k352 in the bulk 180°Y-cut LiNbO3 and 147°Y-cut LiNbO3. Therefore, the mechanical thinning of bulk LiNbO3 single crystal plate has been used to fabricate the thin single crystalline layer for BAW resonators. However, wafer size of these top-down process is limited to 6 inch because the size of the bulk LiNbO3 single crystal wafer. In contrast, bottom-up process such as sputtering growth is well-developed in the 8 inch wafer such as AlN films. In this study, we report the epitaxial growth of (10-12) LiNbO3 on epitaxial (11-20) Al doped conductive ZnO layer (AZO) / (10-12) Al2O3 substrate. Shear mode acoustic properties of the epitaxial (10-12) LiNbO3 film resonator were reported. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | LiNbO3 / Sputtering deposition / Shear mode / Epitaxial growth / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 122, no. 323, US2022-66, pp. 86-91, Dec. 2022. | |
| Paper # | US2022-66 | |
| Date of Issue | 2022-12-15 (US) | |
| ISSN | Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | US2022-66 |
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| Conference Information | |
| Committee | EA US |
| Conference Date | 2022-12-22 - 2022-12-23 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Satellite Campus Hiroshima |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | [Joint Meeting on Acoustics and Ultrasonics Subsociety] Engineering/Electro Acoustics, Ultrasonics, etc. |
| Paper Information | |
| Registration To | US |
| Conference Code | 2022-12-EA-US |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Sputter epitaxial LiNbO3 film shear mode thin film resonators |
| Sub Title (in English) | |
| Keyword(1) | LiNbO3 |
| Keyword(2) | Sputtering deposition |
| Keyword(3) | Shear mode |
| Keyword(4) | Epitaxial growth |
| Keyword(5) | |
| Keyword(6) | |
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| Keyword(8) | |
| 1st Author's Name | Shinya Kudo |
| 1st Author's Affiliation | Waseda University (Wseda Univ.) |
| 2nd Author's Name | Takahiko Yanagitani |
| 2nd Author's Affiliation | Waseda University (Waseda Univ.) |
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| Speaker | Author-1 |
| Date Time | 2022-12-22 16:50:00 |
| Presentation Time | 120 minutes |
| Registration for | US |
| Paper # | US2022-66 |
| Volume (vol) | vol.122 |
| Number (no) | no.323 |
| Page | pp.86-91 |
| #Pages | 6 |
| Date of Issue | 2022-12-15 (US) |
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