Paper Abstract and Keywords |
Presentation |
2023-03-04 11:30
Clone Resistance of Artifact Metrics Systems Based on White Light Interferometry and Phase Only Correlation Akira Iwahashi, Naoki Yoshida, Tsutomu Matsumoto (YNU) VLD2022-118 HWS2022-89 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Artifact Metrics is a technique for authenticating artifacts using characteristics unique to each artifact. Unlike conventional anti-counterfeiting technology that relies on the technological superiority of the manufacturer for security, artifact metrics use characteristics that are difficult even for manufacturers to duplicate, so they are different from those that measure the same value as genuine individuals. It is expected to have "cloning resistance", which makes it extremely difficult to create objects of In a system that uses a white light interferometer to capture and authenticate a nanometer-order random uneven structure that utilizes the collapse phenomenon of electron beam resist pillars in electron beam lithography, matching using ZNCC (Zero-means Normalized Cross-Correlation) Accuracy experiments show that the Equal Error Rate is less than 1 in 100 million. On the other hand, processing technology is also progressing day by day, and in order to ensure security, it is required to actually create a clone and evaluate the system. In this study, we show that highly accurate clones fabricated by scanning probe lithography can be discriminated by a system using a white interferometer and a phase-only correlation method. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
artifact metrics / resist collapse / white light interferometer / clonal resistance / phase only correlation / / / |
Reference Info. |
IEICE Tech. Rep., vol. 122, no. 403, HWS2022-89, pp. 251-256, March 2023. |
Paper # |
HWS2022-89 |
Date of Issue |
2023-02-22 (VLD, HWS) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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VLD2022-118 HWS2022-89 |
Conference Information |
Committee |
HWS VLD |
Conference Date |
2023-03-01 - 2023-03-04 |
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Paper Information |
Registration To |
HWS |
Conference Code |
2023-03-HWS-VLD |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Clone Resistance of Artifact Metrics Systems Based on White Light Interferometry and Phase Only Correlation |
Sub Title (in English) |
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Keyword(1) |
artifact metrics |
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resist collapse |
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white light interferometer |
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clonal resistance |
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phase only correlation |
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1st Author's Name |
Akira Iwahashi |
1st Author's Affiliation |
Yokohama National University (YNU) |
2nd Author's Name |
Naoki Yoshida |
2nd Author's Affiliation |
Yokohama National University (YNU) |
3rd Author's Name |
Tsutomu Matsumoto |
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Yokohama National University (YNU) |
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Speaker |
Author-1 |
Date Time |
2023-03-04 11:30:00 |
Presentation Time |
25 minutes |
Registration for |
HWS |
Paper # |
VLD2022-118, HWS2022-89 |
Volume (vol) |
vol.122 |
Number (no) |
no.402(VLD), no.403(HWS) |
Page |
pp.251-256 |
#Pages |
6 |
Date of Issue |
2023-02-22 (VLD, HWS) |
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