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Paper Abstract and Keywords
Presentation 2023-03-04 11:30
Clone Resistance of Artifact Metrics Systems Based on White Light Interferometry and Phase Only Correlation
Akira Iwahashi, Naoki Yoshida, Tsutomu Matsumoto (YNU) VLD2022-118 HWS2022-89
Abstract (in Japanese) (See Japanese page) 
(in English) Artifact Metrics is a technique for authenticating artifacts using characteristics unique to each artifact. Unlike conventional anti-counterfeiting technology that relies on the technological superiority of the manufacturer for security, artifact metrics use characteristics that are difficult even for manufacturers to duplicate, so they are different from those that measure the same value as genuine individuals. It is expected to have "cloning resistance", which makes it extremely difficult to create objects of In a system that uses a white light interferometer to capture and authenticate a nanometer-order random uneven structure that utilizes the collapse phenomenon of electron beam resist pillars in electron beam lithography, matching using ZNCC (Zero-means Normalized Cross-Correlation) Accuracy experiments show that the Equal Error Rate is less than 1 in 100 million. On the other hand, processing technology is also progressing day by day, and in order to ensure security, it is required to actually create a clone and evaluate the system. In this study, we show that highly accurate clones fabricated by scanning probe lithography can be discriminated by a system using a white interferometer and a phase-only correlation method.
Keyword (in Japanese) (See Japanese page) 
(in English) artifact metrics / resist collapse / white light interferometer / clonal resistance / phase only correlation / / /  
Reference Info. IEICE Tech. Rep., vol. 122, no. 403, HWS2022-89, pp. 251-256, March 2023.
Paper # HWS2022-89 
Date of Issue 2023-02-22 (VLD, HWS) 
ISSN Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee HWS VLD  
Conference Date 2023-03-01 - 2023-03-04 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
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Paper Information
Registration To HWS 
Conference Code 2023-03-HWS-VLD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Clone Resistance of Artifact Metrics Systems Based on White Light Interferometry and Phase Only Correlation 
Sub Title (in English)  
Keyword(1) artifact metrics  
Keyword(2) resist collapse  
Keyword(3) white light interferometer  
Keyword(4) clonal resistance  
Keyword(5) phase only correlation  
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1st Author's Name Akira Iwahashi  
1st Author's Affiliation Yokohama National University (YNU)
2nd Author's Name Naoki Yoshida  
2nd Author's Affiliation Yokohama National University (YNU)
3rd Author's Name Tsutomu Matsumoto  
3rd Author's Affiliation Yokohama National University (YNU)
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Speaker Author-1 
Date Time 2023-03-04 11:30:00 
Presentation Time 25 minutes 
Registration for HWS 
Paper # VLD2022-118, HWS2022-89 
Volume (vol) vol.122 
Number (no) no.402(VLD), no.403(HWS) 
Page pp.251-256 
#Pages
Date of Issue 2023-02-22 (VLD, HWS) 


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