Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2023-04-15 10:05
Clone Resistance of Artifact Metric Systems Based on White Light Interferometry and Correlation coefficient
Akira Iwahashi, Naoki Yoshida, Tsutomu Matsumoto (YNU) HWS2023-11
Abstract (in Japanese) (See Japanese page) 
(in English) Artifact metrics are a technology that authenticates artifacts using features unique to each artifact. Unlike conventional anti-counterfeiting technologies, which use the technical superiority of the manufacturer as the basis for security, artifact metrics are expected to be "clone-resistant," meaning that it is extremely difficult to create another object that measures the same value as a real individual, because they use features that are difficult to replicate even by the manufacturer. In an authentication system that uses white light interferometry to image random uneven structures on the order of nanometer using the collapse phenomenon of electron-beam resist pillars in electron-beam lithography, matching accuracy experiments have shown that the Equal Error Rate is smaller than 1/100 million. On the other hand, processing technology is advancing day by day, and actual cloning and evaluation of the system are required to ensure security. In this study, we show that clones fabricated by scanning probe lithography can be rejected by a system using white light interferometry and correlation coefficients.
Keyword (in Japanese) (See Japanese page) 
(in English) artifact metrics / resist collapse / white light interferometer / clonal resistance / correlation coefficient / / /  
Reference Info. IEICE Tech. Rep., vol. 123, no. 6, HWS2023-11, pp. 43-48, April 2023.
Paper # HWS2023-11 
Date of Issue 2023-04-07 (HWS) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF HWS2023-11

Conference Information
Committee HWS  
Conference Date 2023-04-14 - 2023-04-15 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To HWS 
Conference Code 2023-04-HWS 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Clone Resistance of Artifact Metric Systems Based on White Light Interferometry and Correlation coefficient 
Sub Title (in English)  
Keyword(1) artifact metrics  
Keyword(2) resist collapse  
Keyword(3) white light interferometer  
Keyword(4) clonal resistance  
Keyword(5) correlation coefficient  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Akira Iwahashi  
1st Author's Affiliation Yokohama National University (YNU)
2nd Author's Name Naoki Yoshida  
2nd Author's Affiliation Yokohama National University (YNU)
3rd Author's Name Tsutomu Matsumoto  
3rd Author's Affiliation Yokohama National University (YNU)
4th Author's Name  
4th Author's Affiliation ()
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2023-04-15 10:05:00 
Presentation Time 25 minutes 
Registration for HWS 
Paper # HWS2023-11 
Volume (vol) vol.123 
Number (no) no.6 
Page pp.43-48 
#Pages 6 
Date of Issue 2023-04-07 (HWS) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan