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Paper Abstract and Keywords
Presentation 2023-07-25 11:40
Clone Resistance of Artifact Metrics: Spatial Frequency Filtering
Akira Iwahashi, Iwaki Miyamoto, Naoki Yoshida, Tsutomu Matsumoto (YNU) ISEC2023-43 SITE2023-37 BioX2023-46 HWS2023-43 ICSS2023-40 EMM2023-43
Abstract (in Japanese) (See Japanese page) 
(in English) Artifact metrics is a technology that uses features unique to an artifact to authenticate the artifact in question. Unlike conventional anti-counterfeiting technology, which relies on the technical superiority of the manufacturer as the basis for security, artifact metrics is expected to be 'clone-resistant', as artifact uses features that is difficult to replicate, even for the manufacturer, therefore extremely difficult to clone. Systems based on white interferometry and correlation coefficients have been shown to be able to reject clones produced by scanning probe lithography with high accuracy by applying spatial frequency filtering to the interferogram. This paper analyses how the spatial frequency of the interferogram affects the clone resistance of the system and discusses the choice of spatial frequency filtering parameters to be employed.
Keyword (in Japanese) (See Japanese page) 
(in English) artifact metrics / resist collapse / white light interferometry / clonal resistance / freqency filtering / / /  
Reference Info. IEICE Tech. Rep., vol. 123, no. 132, HWS2023-43, pp. 188-193, July 2023.
Paper # HWS2023-43 
Date of Issue 2023-07-17 (ISEC, SITE, BioX, HWS, ICSS, EMM) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ISEC2023-43 SITE2023-37 BioX2023-46 HWS2023-43 ICSS2023-40 EMM2023-43

Conference Information
Committee EMM BioX ISEC SITE ICSS HWS IPSJ-CSEC IPSJ-SPT 
Conference Date 2023-07-24 - 2023-07-25 
Place (in Japanese) (See Japanese page) 
Place (in English) Hokkaido Jichiro Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To HWS 
Conference Code 2023-07-EMM-BioX-ISEC-SITE-ICSS-HWS-CSEC-SPT 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Clone Resistance of Artifact Metrics: Spatial Frequency Filtering 
Sub Title (in English)  
Keyword(1) artifact metrics  
Keyword(2) resist collapse  
Keyword(3) white light interferometry  
Keyword(4) clonal resistance  
Keyword(5) freqency filtering  
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1st Author's Name Akira Iwahashi  
1st Author's Affiliation Yokohama National University (YNU)
2nd Author's Name Iwaki Miyamoto  
2nd Author's Affiliation Yokohama National University (YNU)
3rd Author's Name Naoki Yoshida  
3rd Author's Affiliation Yokohama National University (YNU)
4th Author's Name Tsutomu Matsumoto  
4th Author's Affiliation Yokohama National University (YNU)
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Speaker Author-1 
Date Time 2023-07-25 11:40:00 
Presentation Time 20 minutes 
Registration for HWS 
Paper # ISEC2023-43, SITE2023-37, BioX2023-46, HWS2023-43, ICSS2023-40, EMM2023-43 
Volume (vol) vol.123 
Number (no) no.129(ISEC), no.130(SITE), no.131(BioX), no.132(HWS), no.133(ICSS), no.134(EMM) 
Page pp.188-193 
#Pages 6 
Date of Issue 2023-07-17 (ISEC, SITE, BioX, HWS, ICSS, EMM) 

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