IEICE Technical Committee Submission System
Conference Paper's Information
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2023-11-27 13:45
Improvement of in-plane orientation and piezoelectricity of c-axis parallel oriented ZnO films and their application to thickness shear-mode resonators -- Investigation on limiting of particle irradiation to substrate during sputtering deposition --
Naoki Tomiyama, Shinji Takayanagi (Doshisha Univ.), Yanagitani Takahiko (Waseda Univ.) US2023-49
Abstract (in Japanese) (See Japanese page) 
(in English) ZnO films with the crystalline c-axis parallel to the substrate can excite shear waves and are suitable for thickness-shear mode resonators. They were obtained by irradiating the substrate with negative ions generated near ZnO target at high energy during an RF magnetron sputtering. It is necessary to align the in-plane direction of the c-axis to obtain high piezoelectricity. In this study, we focused on the irradiation direction of negative ions to the substrate in the RF magnetron sputtering, and prepared ZnO films with shields placed on the substrate. It was found that the in-plane orientation and piezoelectricity of the ZnO film were improved by limiting the negative ion irradiation direction with the shield. Then, the ZnO film prepared with the shield was applied to a thickness-shear mode resonator. The admittance ratio between resonance and anti-resonance was larger than that without the shield, resulting in improved resonance characteristics.
Keyword (in Japanese) (See Japanese page) 
(in English) Thickness shear-mode / Thin film resonator / ZnO / Sputtering deposition / / / /  
Reference Info. IEICE Tech. Rep., vol. 123, no. 286, US2023-49, pp. 34-39, Nov. 2023.
Paper # US2023-49 
Date of Issue 2023-11-20 (US) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF US2023-49

Conference Information
Committee US  
Conference Date 2023-11-27 - 2023-11-27 
Place (in Japanese) (See Japanese page) 
Place (in English) Shizuoka University 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Ultrasonics, etc. 
Paper Information
Registration To US 
Conference Code 2023-11-US 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Improvement of in-plane orientation and piezoelectricity of c-axis parallel oriented ZnO films and their application to thickness shear-mode resonators 
Sub Title (in English) Investigation on limiting of particle irradiation to substrate during sputtering deposition 
Keyword(1) Thickness shear-mode  
Keyword(2) Thin film resonator  
Keyword(3) ZnO  
Keyword(4) Sputtering deposition  
Keyword(5)  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Naoki Tomiyama  
1st Author's Affiliation Doshisha University (Doshisha Univ.)
2nd Author's Name Shinji Takayanagi  
2nd Author's Affiliation Doshisha University (Doshisha Univ.)
3rd Author's Name Yanagitani Takahiko  
3rd Author's Affiliation Waseda University (Waseda Univ.)
4th Author's Name  
4th Author's Affiliation ()
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
Speaker Author-1 
Date Time 2023-11-27 13:45:00 
Presentation Time 25 minutes 
Registration for US 
Paper # US2023-49 
Volume (vol) vol.123 
Number (no) no.286 
Page pp.34-39 
#Pages
Date of Issue 2023-11-20 (US) 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan