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| Presentation | 2023-11-30 14:20 Steam Oxidation Technique for Defect Reduction on ALD-Al2O3 Insulated-gate structures Shiro Ozaki, Yusuke Kumazaki, Naoya Okamoto, Yasuhiro Nakasya, Toshihiro Tagi, Naoki Hara (Fujitsu)  ED2023-17 CPM2023-59 LQE2023-57 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In this study, we investigated the effect of oxidant sources on carbon-related impurities in atomic layer deposited (ALD)-Al2O3 by focusing on plasma-induced decomposition of –CH3 groups which attributed in ALD precursor. We found that the C–O bonds were detected in the ALD-Al2O3 using O2 plasma instead of the C–H bonds which attributed to –CH3 groups of trimethylaluminum. It is considered that the decomposition of –CH3 groups was enhanced by O2 plasma, and C–O residue was generated. We concluded that the decomposition of –CH3 groups by oxidant sources must be suppressed to reduce the carbon-related impurities in ALD-Al2O3. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | ALD-Al2O3 / oxidant Sources / carbon-related impurities / O2 plasma / H2O vapor / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 123, no. 288, ED2023-17, pp. 15-20, Nov. 2023. | |
| Paper # | ED2023-17 | |
| Date of Issue | 2023-11-23 (ED, CPM, LQE) | |
| ISSN | Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2023-17 CPM2023-59 LQE2023-57 |
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| Conference Information | |
| Committee | LQE ED CPM |
| Conference Date | 2023-11-30 - 2023-12-01 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | ED |
| Conference Code | 2023-11-LQE-ED-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Steam Oxidation Technique for Defect Reduction on ALD-Al2O3 Insulated-gate structures |
| Sub Title (in English) | |
| Keyword(1) | ALD-Al2O3 |
| Keyword(2) | oxidant Sources |
| Keyword(3) | carbon-related impurities |
| Keyword(4) | O2 plasma |
| Keyword(5) | H2O vapor |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Shiro Ozaki |
| 1st Author's Affiliation | Fujitsu Ltd. (Fujitsu) |
| 2nd Author's Name | Yusuke Kumazaki |
| 2nd Author's Affiliation | Fujitsu Ltd. (Fujitsu) |
| 3rd Author's Name | Naoya Okamoto |
| 3rd Author's Affiliation | Fujitsu Ltd. (Fujitsu) |
| 4th Author's Name | Yasuhiro Nakasya |
| 4th Author's Affiliation | Fujitsu Ltd. (Fujitsu) |
| 5th Author's Name | Toshihiro Tagi |
| 5th Author's Affiliation | Fujitsu Ltd. (Fujitsu) |
| 6th Author's Name | Naoki Hara |
| 6th Author's Affiliation | Fujitsu Ltd. (Fujitsu) |
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| Speaker | Author-1 |
| Date Time | 2023-11-30 14:20:00 |
| Presentation Time | 25 minutes |
| Registration for | ED |
| Paper # | ED2023-17, CPM2023-59, LQE2023-57 |
| Volume (vol) | vol.123 |
| Number (no) | no.288(ED), no.289(CPM), no.290(LQE) |
| Page | pp.15-20 |
| #Pages | 6 |
| Date of Issue | 2023-11-23 (ED, CPM, LQE) |
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