Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2024-01-17 11:20
A study on 3D model adaptation for generating patch-based adversarial perturbations
Hiroto Takiwaki (Okayama Univ.), Minoru Kuribayashi (Touhoku Univ.), Nobuo Funabiki (Okayama Univ.) EMM2023-88
Abstract (in Japanese) (See Japanese page) 
(in English) The development of facial recognition technology using machine learning has made it possible to recognize individuals from photographs and videos. Although these technologies are useful, if these are misused, individuals can be recognized and tracked from surveillance cameras, etc., and their privacy can be violated. Therefore, there is a growing need for methods to avoid face recognition. Several methods for generating adversarial noise have been investigated to avoid face recognition.
In this study, we propose a method that uses a 3D mesh to replace a previous method that uses semi-transparent patches to generate adversarial noise in face regions at various positions and sizes. In the previous method, patches are generated directly from 2D images and do not take into the consideration of 3D volumes on the face surface. In this paper, we propose a method to simulate 3D deformation when applying a patch by extracting feature points from a face image and developing them into a texture. In addition, the problem of including unattachable areas such as eyes in the patches is solved by setting the patches on the texture.
Experimental results show that the proposed method can generate adversarial noise with higher accuracy than the previous method for the same patch size, and that even when patch regions are set on the texture, the avoidance accuracy of face recognition is similar to that of the previous method depending on the position and size of the patches.
Keyword (in Japanese) (See Japanese page) 
(in English) face recognition / adversarial example / FGSM / face mesh / / / /  
Reference Info. IEICE Tech. Rep., vol. 123, no. 332, EMM2023-88, pp. 44-49, Jan. 2024.
Paper # EMM2023-88 
Date of Issue 2024-01-09 (EMM) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF EMM2023-88

Conference Information
Committee EMM  
Conference Date 2024-01-16 - 2024-01-17 
Place (in Japanese) (See Japanese page) 
Place (in English) Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Sense of Presence, Universal Media, Digital Entertainment, etc. 
Paper Information
Registration To EMM 
Conference Code 2024-01-EMM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) A study on 3D model adaptation for generating patch-based adversarial perturbations 
Sub Title (in English) * 
Keyword(1) face recognition  
Keyword(2) adversarial example  
Keyword(3) FGSM  
Keyword(4) face mesh  
Keyword(5)  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Hiroto Takiwaki  
1st Author's Affiliation Okayama University (Okayama Univ.)
2nd Author's Name Minoru Kuribayashi  
2nd Author's Affiliation Touhoku University (Touhoku Univ.)
3rd Author's Name Nobuo Funabiki  
3rd Author's Affiliation Okayama University (Okayama Univ.)
4th Author's Name  
4th Author's Affiliation ()
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2024-01-17 11:20:00 
Presentation Time 25 minutes 
Registration for EMM 
Paper # EMM2023-88 
Volume (vol) vol.123 
Number (no) no.332 
Page pp.44-49 
#Pages 6 
Date of Issue 2024-01-09 (EMM) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan