| Paper Abstract and Keywords |
| Presentation |
2024-01-25 15:55
Development of GaN HEMT using a diamond substrate as a heat spreader Yusuke Shirayanagi (Mitsubishi Electric/Kumamoto Univ.), Shingo Tomohisa (Mitsubishi Electric), Keiji Kasamura, Hiroki Toyoda (Kumamoto Univ.), Takashi Matsumae, Yuichi Kurashima, Hideki Takagi (AIST), Akihisa Kubota (Kumamoto Univ.), Takashi Takenaga (Mitsubishi Electric) ED2023-69 MW2023-161 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
1-inch size GaN-on-Diamond high electron mobility transistors (GoD HEMTs) has been successfully fabricated using surface-activated room-temperature bonding of a substrate where GaN HEMTs are formed on mosaic diamond substrate. The bonding area of over 95% is achieved due to the limited surface average roughness of less than 0.3nm for both bonding substrate surfaces. The drain current (Id) - drain voltage (Vd) characteristics indicates that GaN HEMTs have been transferred on the diamond substrate without any negative effects of the bonding step. The 2D-temperature mapping results demonstrate drastic suppression of temperature rising during transistor-operation due to the effective heat dissipation through the mosaic diamond substrate. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
GaN / HEMT / Diamond / Bonding / Polishing / GaN-on-Diamond / / |
| Reference Info. |
IEICE Tech. Rep., vol. 123, no. 365, ED2023-69, pp. 15-18, Jan. 2024. |
| Paper # |
ED2023-69 |
| Date of Issue |
2024-01-18 (ED, MW) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2023-69 MW2023-161 |