| Paper Abstract and Keywords |
| Presentation |
2024-08-23 14:15
Fabrication and Characterization of Indium Oxide Thin-Film Transistors using Excimer Light Assist Process Ryosuke Kasahara, Takeaki Komai, Hideo Wada, Masatoshi Koyama, Akihiko Fujii (Osaka Inst. of Tech.), Akihiro Shimizu, Noritaka Takezoe, Shion Yamaguchi, Hiroyasu Ito (Ushio Inc.), Toshihiko Maemoto (Osaka Inst. of Tech.) ED2024-15 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
Indium oxide (In2O3) thin-films exhibit higher electron mobility and lower off-leakage compared to Low-Temperature Polycrystalline Silicon (LTPS), making them promising candidates for next-generation OLED displays. We have fabricated In2O3 thin-film transistors (TFTs) using a solution method with a carbon-free aqueous solution-based precursor and excimer light, and have characterized the transfer characteristics of TFTs. In this report, we describe the successful fabrication of an In2O3-TFT with an off-leak current of 7.2×10^-13 A/um, an on/off ratio of 5.9×10^6, and a field-effect mobility of 28 cm^2/Vs. Additionally, we confirmed the effectiveness of introducing excimer light in processes below 300℃. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Oxide Semiconductor / Indium Oxide / Thin-Film Transistor / Solution Process / Excimer Lamp / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 124, no. 158, ED2024-15, pp. 8-11, Aug. 2024. |
| Paper # |
ED2024-15 |
| Date of Issue |
2024-08-16 (ED) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2024-15 |