| Paper Abstract and Keywords |
| Presentation |
2024-10-24 16:20
Statistical Capacitance Evaluation of Si Trench Capacitor Using Impedance Measurement Platform Ryoya Nishimaki, Koga Saito, Takezo Mawaki, Rihito Kuroda (Tohoku Univ.) SDM2024-52 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
A statistical capacitance evaluation of Si trench capacitors using the impedance measurement platform that enables high-speed and high-precision statistical capacitance measurement of device under tests (DUTs) formed in a 2D array is presented. Si trench capacitor is a 3D structured capacitor with enlarged surface areas formed by etching Si substrate compared to a planar capacitor. We formed Si trench capacitors on this platform as DUTs and achieved statistical capacitance measurements in the fF to pF range. In addition, we measured Si trench capacitors with different structures, and discussed the effect of the DUT structure on capacitance measurements. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
Capacitance Measurement / Trench Capacitor / Array Test Circuit / Platform / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 124, no. 222, SDM2024-52, pp. 34-37, Oct. 2024. |
| Paper # |
SDM2024-52 |
| Date of Issue |
2024-10-17 (SDM) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
SDM2024-52 |
| Conference Information |
| Committee |
SDM |
| Conference Date |
2024-10-24 - 2024-10-24 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
NICHe, Tohoku Univ. |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Process Science and New Process Technology |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2024-10-SDM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Statistical Capacitance Evaluation of Si Trench Capacitor Using Impedance Measurement Platform |
| Sub Title (in English) |
|
| Keyword(1) |
Capacitance Measurement |
| Keyword(2) |
Trench Capacitor |
| Keyword(3) |
Array Test Circuit |
| Keyword(4) |
Platform |
| Keyword(5) |
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| Keyword(6) |
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| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Ryoya Nishimaki |
| 1st Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 2nd Author's Name |
Koga Saito |
| 2nd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 3rd Author's Name |
Takezo Mawaki |
| 3rd Author's Affiliation |
Tohoku University (Tohoku Univ.) |
| 4th Author's Name |
Rihito Kuroda |
| 4th Author's Affiliation |
Tohoku University (Tohoku Univ.) |
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| Speaker |
Author-1 |
| Date Time |
2024-10-24 16:20:00 |
| Presentation Time |
20 minutes |
| Registration for |
SDM |
| Paper # |
SDM2024-52 |
| Volume (vol) |
vol.124 |
| Number (no) |
no.222 |
| Page |
pp.34-37 |
| #Pages |
4 |
| Date of Issue |
2024-10-17 (SDM) |