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Paper Abstract and Keywords
Presentation 2025-11-14 11:30
[Invited Talk] Purge Effect Simulation of Atomic Layer Deposition for High Aspect Ratio Structure
Satoshi Nakamura, Hisashi Kotakemori, Kenta Yashima, Taishi Ikeda, Takumi Ohmura, Yasuyuki Kayama (DSRJ), YunTae Lee, Gwangsu Yoo, Yukihide Tsuji, Shinwook Yi, Jaehoon Jeong, Dae Sin Kim (SEC) SDM2025-60
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
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Reference Info. IEICE Tech. Rep., vol. 125, no. 246, SDM2025-60, pp. 28-33, Nov. 2025.
Paper # SDM2025-60 
Date of Issue 2025-11-06 (SDM) 
ISSN Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2025-11-13 - 2025-11-14 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process, Device, Circuit simulation, etc. 
Paper Information
Registration To SDM 
Conference Code 2025-11-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Purge Effect Simulation of Atomic Layer Deposition for High Aspect Ratio Structure 
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1st Author's Name Satoshi Nakamura  
1st Author's Affiliation Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ)
2nd Author's Name Hisashi Kotakemori  
2nd Author's Affiliation Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ)
3rd Author's Name Kenta Yashima  
3rd Author's Affiliation Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ)
4th Author's Name Taishi Ikeda  
4th Author's Affiliation Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ)
5th Author's Name Takumi Ohmura  
5th Author's Affiliation Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ)
6th Author's Name Yasuyuki Kayama  
6th Author's Affiliation Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ)
7th Author's Name YunTae Lee  
7th Author's Affiliation CSE Team, Samsung Electronics (SEC)
8th Author's Name Gwangsu Yoo  
8th Author's Affiliation CSE Team, Samsung Electronics (SEC)
9th Author's Name Yukihide Tsuji  
9th Author's Affiliation CSE Team, Samsung Electronics (SEC)
10th Author's Name Shinwook Yi  
10th Author's Affiliation CSE Team, Samsung Electronics (SEC)
11th Author's Name Jaehoon Jeong  
11th Author's Affiliation CSE Team, Samsung Electronics (SEC)
12th Author's Name Dae Sin Kim  
12th Author's Affiliation CSE Team, Samsung Electronics (SEC)
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Speaker Author-1 
Date Time 2025-11-14 11:30:00 
Presentation Time 50 minutes 
Registration for SDM 
Paper # SDM2025-60 
Volume (vol) vol.125 
Number (no) no.246 
Page pp.28-33 
#Pages
Date of Issue 2025-11-06 (SDM) 


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