| Paper Abstract and Keywords |
| Presentation |
2025-11-14 11:30
[Invited Talk]
Purge Effect Simulation of Atomic Layer Deposition for High Aspect Ratio Structure Satoshi Nakamura, Hisashi Kotakemori, Kenta Yashima, Taishi Ikeda, Takumi Ohmura, Yasuyuki Kayama (DSRJ), YunTae Lee, Gwangsu Yoo, Yukihide Tsuji, Shinwook Yi, Jaehoon Jeong, Dae Sin Kim (SEC) SDM2025-60 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
(Not available yet) |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
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| Reference Info. |
IEICE Tech. Rep., vol. 125, no. 246, SDM2025-60, pp. 28-33, Nov. 2025. |
| Paper # |
SDM2025-60 |
| Date of Issue |
2025-11-06 (SDM) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
SDM2025-60 |
| Conference Information |
| Committee |
SDM |
| Conference Date |
2025-11-13 - 2025-11-14 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
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| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Process, Device, Circuit simulation, etc. |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2025-11-SDM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Purge Effect Simulation of Atomic Layer Deposition for High Aspect Ratio Structure |
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| 1st Author's Name |
Satoshi Nakamura |
| 1st Author's Affiliation |
Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ) |
| 2nd Author's Name |
Hisashi Kotakemori |
| 2nd Author's Affiliation |
Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ) |
| 3rd Author's Name |
Kenta Yashima |
| 3rd Author's Affiliation |
Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ) |
| 4th Author's Name |
Taishi Ikeda |
| 4th Author's Affiliation |
Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ) |
| 5th Author's Name |
Takumi Ohmura |
| 5th Author's Affiliation |
Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ) |
| 6th Author's Name |
Yasuyuki Kayama |
| 6th Author's Affiliation |
Samsung Devise Solutions R&D Japan, Samsung Japan Corporation (DSRJ) |
| 7th Author's Name |
YunTae Lee |
| 7th Author's Affiliation |
CSE Team, Samsung Electronics (SEC) |
| 8th Author's Name |
Gwangsu Yoo |
| 8th Author's Affiliation |
CSE Team, Samsung Electronics (SEC) |
| 9th Author's Name |
Yukihide Tsuji |
| 9th Author's Affiliation |
CSE Team, Samsung Electronics (SEC) |
| 10th Author's Name |
Shinwook Yi |
| 10th Author's Affiliation |
CSE Team, Samsung Electronics (SEC) |
| 11th Author's Name |
Jaehoon Jeong |
| 11th Author's Affiliation |
CSE Team, Samsung Electronics (SEC) |
| 12th Author's Name |
Dae Sin Kim |
| 12th Author's Affiliation |
CSE Team, Samsung Electronics (SEC) |
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| Speaker |
Author-1 |
| Date Time |
2025-11-14 11:30:00 |
| Presentation Time |
50 minutes |
| Registration for |
SDM |
| Paper # |
SDM2025-60 |
| Volume (vol) |
vol.125 |
| Number (no) |
no.246 |
| Page |
pp.28-33 |
| #Pages |
6 |
| Date of Issue |
2025-11-06 (SDM) |