| Paper Abstract and Keywords |
| Presentation |
2026-03-02 14:35
Self-Limiting Dielectrophoretic Process of Gold Nanoparticles for Single-Electron Device Fabrication Yuito Iinuma, Hiroshi Shimada, Yoshinao Mizugaki (UEC Tokyo) CPM2025-73 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
When an electric field is applied to a nanogap placed in a colloidal solution, a dielectrophoretic force is applied to the nanoparticles in the colloidal solution, causing the nanoparticles to aggregate in the gap. In self-limiting dielectrophoresis that was recently proposed, a capacitance element is connected in series with the nanogap region. When nanoparticles are first assembled in the gap region and the impedance there decreases, most of the applied AC voltage is redistributed to the capacitance element, thereby suppressing further particle assembly in the gap region. In this study, gold nanoparticles were assembled between the drain and source electrodes using self-limiting dielectrophoresis, and the appropriate assembly conditions for single-electron device fabrication were investigated. Furthermore, the electrical characteristics of the fabricated devices were measured in liquid helium (4.2 K) to evaluate their operation as single-electron devices. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
dielectrophoresis / single-electron transistor / Coulomb blockade / gold nanoparticles / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 125, no. 374, CPM2025-73, pp. 16-19, March 2026. |
| Paper # |
CPM2025-73 |
| Date of Issue |
2026-02-23 (CPM) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
CPM2025-73 |
| Conference Information |
| Committee |
CPM |
| Conference Date |
2026-03-02 - 2026-03-02 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
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| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
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| Paper Information |
| Registration To |
CPM |
| Conference Code |
2026-03-CPM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Self-Limiting Dielectrophoretic Process of Gold Nanoparticles for Single-Electron Device Fabrication |
| Sub Title (in English) |
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| Keyword(1) |
dielectrophoresis |
| Keyword(2) |
single-electron transistor |
| Keyword(3) |
Coulomb blockade |
| Keyword(4) |
gold nanoparticles |
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| 1st Author's Name |
Yuito Iinuma |
| 1st Author's Affiliation |
The University of Electro-Communications (UEC Tokyo) |
| 2nd Author's Name |
Hiroshi Shimada |
| 2nd Author's Affiliation |
The University of Electro-Communications (UEC Tokyo) |
| 3rd Author's Name |
Yoshinao Mizugaki |
| 3rd Author's Affiliation |
The University of Electro-Communications (UEC Tokyo) |
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| Speaker |
Author-1 |
| Date Time |
2026-03-02 14:35:00 |
| Presentation Time |
20 minutes |
| Registration for |
CPM |
| Paper # |
CPM2025-73 |
| Volume (vol) |
vol.125 |
| Number (no) |
no.374 |
| Page |
pp.16-19 |
| #Pages |
4 |
| Date of Issue |
2026-02-23 (CPM) |