| Paper Abstract and Keywords |
| Presentation |
2026-05-22 15:45
Contact analysis of GaSb nanowires grown by MBE Soh Komatsu, Masashi Akabori (JAIST) ED2026-7 CPM2026-7 SDM2026-13 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
GaSb nanowires are promising channel materials for p-type gate-all-around FETs. However, the growth of GaSb nanowires is challenging due to the anti-surfactant effect of antimony, and there are few reports on their growth and electrical characteristics. We have previously reported the growth of GaSb nanowires by molecular beam epitaxy using a hydrogen silsesquioxane mask, and the p-channel operation of GaSb nanowire FETs. Currently, we are investigating electrical and contact properties using multi-terminal GaSb nanowire devices. In this report, we present the results of contact analysis utilizing 4-terminal and contact end resistance measurements. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
GaSb nanowire / Contact resistance / Contact end resistance / MBE / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 126, no. 35, ED2026-7, pp. 25-28, May 2026. |
| Paper # |
ED2026-7 |
| Date of Issue |
2026-05-15 (ED, CPM, SDM) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
ED2026-7 CPM2026-7 SDM2026-13 |
| Conference Information |
| Committee |
CPM ED SDM |
| Conference Date |
2026-05-22 - 2026-05-22 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
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| Topics (in Japanese) |
(See Japanese page) |
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| Paper Information |
| Registration To |
ED |
| Conference Code |
2026-05-CPM-ED-SDM |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Contact analysis of GaSb nanowires grown by MBE |
| Sub Title (in English) |
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| Keyword(1) |
GaSb nanowire |
| Keyword(2) |
Contact resistance |
| Keyword(3) |
Contact end resistance |
| Keyword(4) |
MBE |
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| 1st Author's Name |
Soh Komatsu |
| 1st Author's Affiliation |
Japan Advanced Institute of Science and Technology (JAIST) |
| 2nd Author's Name |
Masashi Akabori |
| 2nd Author's Affiliation |
Japan Advanced Institute of Science and Technology (JAIST) |
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| Speaker |
Author-1 |
| Date Time |
2026-05-22 15:45:00 |
| Presentation Time |
25 minutes |
| Registration for |
ED |
| Paper # |
ED2026-7, CPM2026-7, SDM2026-13 |
| Volume (vol) |
vol.126 |
| Number (no) |
no.35(ED), no.36(CPM), no.37(SDM) |
| Page |
pp.25-28 |
| #Pages |
4 |
| Date of Issue |
2026-05-15 (ED, CPM, SDM) |