| Paper Abstract and Keywords |
| Presentation |
2026-08-04 10:45
Gate-length dependence of subthreshold slope in cryogenic operation of MOSFETs Takumi Katori (AIST/TDU), Hidehiro Asai, Hiroshi Oka, Kimihiko Kato, Takumi Inaba, Yuika Kobayashi, Takashi Nakayama (AIST), Satoshi Moriyama (TDU), Takahiro Mori (AIST) SDM2026-23 ICD2026-13 |
| Abstract |
(in Japanese) |
(See Japanese page) |
| (in English) |
We experimentally found the gate-length dependence of the subthreshold swing (SS) in long-channel n- and p- MOSFETs at cryogenic temperatures and investigated its mechanism using device simulations. Considering the band-edge states and focusing on the dominance of the drift and diffusion current components in the drain current, we found that the drift component highly dominates the current even within the subthreshold current range at cryogenic temperatures. Therefore, the subthreshold swing depends on the gate length due to the gate-length dependence of the drift component. We also highlight the importance of the effect of the band-edge states, which significantly impacts the dominance ratio of the drift component in the subthreshold current range. |
| Keyword |
(in Japanese) |
(See Japanese page) |
| (in English) |
cryo-CMOS / MOSFET / subthreshold swing / band-edge states / / / / |
| Reference Info. |
IEICE Tech. Rep., vol. 126, no. 137, SDM2026-23, pp. 7-10, Aug. 2026. |
| Paper # |
SDM2026-23 |
| Date of Issue |
2026-07-28 (SDM, ICD) |
| ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Download PDF |
SDM2026-23 ICD2026-13 |
| Conference Information |
| Committee |
ICD SDM ITE-IST |
| Conference Date |
2026-08-04 - 2026-08-06 |
| Place (in Japanese) |
(See Japanese page) |
| Place (in English) |
Hokkaido Univ, School of Science 2nd Bldg. Room2-507 |
| Topics (in Japanese) |
(See Japanese page) |
| Topics (in English) |
Analog, Mixed Analog and Digital, RF, and Sensor Interface, Low Voltage/Low Power Techniques, Novel Devices/Circuits, and the Applications |
| Paper Information |
| Registration To |
SDM |
| Conference Code |
2026-08-ICD-SDM-IST |
| Language |
Japanese |
| Title (in Japanese) |
(See Japanese page) |
| Sub Title (in Japanese) |
(See Japanese page) |
| Title (in English) |
Gate-length dependence of subthreshold slope in cryogenic operation of MOSFETs |
| Sub Title (in English) |
|
| Keyword(1) |
cryo-CMOS |
| Keyword(2) |
MOSFET |
| Keyword(3) |
subthreshold swing |
| Keyword(4) |
band-edge states |
| Keyword(5) |
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| Keyword(6) |
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| Keyword(7) |
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| Keyword(8) |
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| 1st Author's Name |
Takumi Katori |
| 1st Author's Affiliation |
National Institute of Advanced Industrial Science and Technology, Tokyo Denki University (AIST/TDU) |
| 2nd Author's Name |
Hidehiro Asai |
| 2nd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 3rd Author's Name |
Hiroshi Oka |
| 3rd Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 4th Author's Name |
Kimihiko Kato |
| 4th Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 5th Author's Name |
Takumi Inaba |
| 5th Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 6th Author's Name |
Yuika Kobayashi |
| 6th Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 7th Author's Name |
Takashi Nakayama |
| 7th Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
| 8th Author's Name |
Satoshi Moriyama |
| 8th Author's Affiliation |
Tokyo Denki University (TDU) |
| 9th Author's Name |
Takahiro Mori |
| 9th Author's Affiliation |
National Institute of Advanced Industrial Science and Technology (AIST) |
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| Speaker |
Author-1 |
| Date Time |
2026-08-04 10:45:00 |
| Presentation Time |
25 minutes |
| Registration for |
SDM |
| Paper # |
SDM2026-23, ICD2026-13 |
| Volume (vol) |
vol.126 |
| Number (no) |
no.137(SDM), no.138(ICD) |
| Page |
pp.7-10 |
| #Pages |
4 |
| Date of Issue |
2026-07-28 (SDM, ICD) |