IEICE Technical Committee Submission System
Conference Schedule
Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

Technical Committee on Silicon Device and Materials (SDM)  (Searched in: 2021)

Search Results: Keywords 'from:2021-10-21 to:2021-10-21'

[Go to Official SDM Homepage (Japanese)] 
Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Ascending)
 Results 1 - 9 of 9  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2021-10-21
10:45
Online Online [Invited Talk] Influence of Fluorine on Reliabilities of SiO2 and SixNy Films
Yuichiro Mitani (Tokyo City Univ.) SDM2021-44
In this paper, the influence of Fluorine incorporation into SiO2 and Si nitride (SixNy) films which are widely used in t... [more] SDM2021-44
pp.1-4
SDM 2021-10-21
11:35
Online Online Characterization of Gallium Oxide Thin Film Deposited by Sputtering Method
Fuminobu Imaizumi (NIT, Oyama college) SDM2021-45
 [more] SDM2021-45
pp.5-7
SDM 2021-10-21
13:00
Online Online A study on Ar/N2-plasma sputtering gas pressure dependence on the LaBxNy insulator formation for non-volatile memory applications
Eun-Ki Hong, Shun-ichiro Ohmi (Tokyo Tech.) SDM2021-46
In this study, we investigated Ar/N2-plasma sputtering gas pressure dependence on the LaBxNy insulator formation. The fl... [more] SDM2021-46
pp.8-11
SDM 2021-10-21
13:25
Online Online A study on the effect of inter layers on ferroelectric nondoped HfO2 formation
Masakazu Tanuma, Joong-Won Shin, Shun-ichiro Ohmi (Tokyo Tech.) SDM2021-47
Ferroelectric HfO_2 thin films are able to be formed on Si substrate, which is difficult for conventional materials due ... [more] SDM2021-47
pp.12-15
SDM 2021-10-21
13:50
Online Online A study on Hf-based MONOS nonvolatile memory with HfO2 and HfON tunneling layers for multi-bit/cell operation
Pyo Jooyoung, Ihara Akio, Ohmi Shun-ichiro (Tokyo Tech.) SDM2021-48
We investigated the in-situ formed Hf-based MONOS non-volatile memory (NVM) device with HfO2 and HfON tunneling layer (T... [more] SDM2021-48
pp.16-19
SDM 2021-10-21
14:30
Online Online [Invited Talk] Device and Integration Technologies Realizing Silicon Quantum Computers
Takahiro Mori (AIST) SDM2021-49
 [more] SDM2021-49
p.20
SDM 2021-10-21
15:20
Online Online Highly sensitive TMR sensor and its application to bio-magnetic field measurement
Mikihiko Oogane (Tohoku Univ.) SDM2021-50
The tunnel magneto-resistive sensor (TMR sensor) using a ferromagnetic tunnel junction with small size and low power con... [more] SDM2021-50
pp.21-22
SDM 2021-10-21
16:00
Online Online Current Measurement Platform Applied for Statistical Measurement of Discharge Current due to Traps in SiN Dielectrics
Koga Saito, Hayato Suzuki, Hyeonwoo Park, Rihito Kuroda (Tohoku Univ.), Akinobu Teramoto (Hiroshima Univ.), Tomoyuki Suwa, Shigetoshi Sugawa (Tohoku Univ.) SDM2021-51
A current measurement platform to measure current across dielectrics with a high precision of $10^{-17}$ A applied for s... [more] SDM2021-51
pp.23-26
SDM 2021-10-21
16:25
Online Online Statistical analysis of RTN behavior on transistor structure, operating region, and carrier transport direction
Ryo Akimoto, Rihito Kuroda, Takezo Mawaki, Shigotoshi Sugawa (Tohoku Univ.) SDM2021-52
 [more] SDM2021-52
pp.27-32
 Results 1 - 9 of 9  /   
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan