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Chair |
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Hiroshige Hirano (TowerPartners Semiconductor) |
Vice Chair |
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Shunichiro Ohmi (Tokyo Inst. of Tech.) |
Secretary |
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Takahiro Mori (AIST), Nobuaki Kobayashi (Nihon Univ.) |
Assistant |
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Taiji Noda (Panasonic), Tomoyuki Suwa (Tohoku Univ.) |
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Conference Date |
Tue, Jun 22, 2021 13:10 - 17:50 |
Topics |
Material Science and Process Technology for MOS Devices and Memories |
Conference Place |
Online Virtual Meeting |
Contact Person |
Takuji HOSOI (Kwansei Gakuin Univ.)
+81-79-565-7129 |
Sponsors |
This conference is co-sponsored by The Japan Society of Applied Physics.
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Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Registration Fee |
This workshop will be held as the IEICE workshop in fully electronic publishing. Registration fee will be necessary except the speakers and participants other than the participants to workshop(s) in non-electronic publishing. See the registration fee page. We request the registration fee or presentation fee to participants who will attend the workshop(s) on SDM. |
Tue, Jun 22 PM 13:00 - 17:50 |
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13:00-13:10 |
8th SDM Young Excellence Award Ceremony ( 10 min. ) |
(1) |
13:10-13:50 |
[Memorial Lecture]
Modification of states of metal copper and copper oxide due to isopropyl alcohol treatment SDM2021-22 |
Takezo Mawaki (Tohoku Univ.), Akinobu Teramoto (Hiroshima Univ.), Katsutoshi Ishii (Tokyo Electron Technology Solutions), Yoshinobu Shiba, Tomoyuki Suwa (Tohoku Univ.), Shuji Azumo, Akira Shimizu, Kota Umezawa (Tokyo Electron Technology Solutions), Rihito Kuroda, Yasuyuki Shirai, Shigetoshi Sugawa (Tohoku Univ.) |
(2) |
13:50-14:30 |
[Memorial Lecture]
Operation mechanism of Si/HZO ferroelectric FETs
-- Role of MOS (MFS) interface -- SDM2021-23 |
Kasidit Toprasertpong, Tsung-En Lee, Zaoyang Lin, Kento Tahara, Kouhei Watanabe, Mitsuru Takenaka, Shinichi Takagi (Univ. Tokyo) |
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14:30-14:40 |
Break ( 10 min. ) |
(3) |
14:40-15:20 |
[Invited Lecture]
FET characteristics with 2D channel SDM2021-24 |
Hitoshi Wakabayashi (Tokyo Tech) |
(4) |
15:20-16:00 |
[Invited Lecture]
Development of TFET-based qubits enabling high-temperature operation to realize silicon-based quantum computing SDM2021-25 |
Takahiro Mori (AIST) |
(5) |
16:00-16:40 |
[Invited Lecture]
For understanding ferroelectric HfO2 toward its device applications SDM2021-26 |
Akira Toriumi |
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16:40-16:50 |
Break ( 10 min. ) |
(6) |
16:50-17:10 |
Application-induced TaOx ReRAM Cell Reliability Variation Tolerated High-speed Storage SDM2021-27 |
Chihiro Matsui, Ken Takeuchi (Univ. Tokyo) |
(7) |
17:10-17:30 |
Influence of quantized bit precision and bit-error rate in Computation-in-Memory with ReRAM on optimal answers of combinatorial optimization problems SDM2021-28 |
Naoko Misawa, Kenta Taoka, Shunsuke Koshino, Chihiro Matsui, Ken Takeuchi (Univ. Tokyo) |
(8) |
17:30-17:50 |
Formation and Thickness Control of Ultrathin Ge Layer on Al and Ag/(111) Structures by Thermal Anneal SDM2021-29 |
Akio Ohta, Keigo Matsushita, Noriyuki Taoka, Katsunori Makihara, Seiichi Miyazaki (Nagoya Univ.) |
Announcement for Speakers |
General Talk | Each speech will have 15 minutes for presentation and 5 minutes for discussion. |
Memorial Lecture | Each speech will have 30 minutes for presentation and 10 minutes for discussion. |
Invited Lecture | Each speech will have 30 minutes for presentation and 10 minutes for discussion. |
Contact Address and Latest Schedule Information |
SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
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Contact Address |
SDM Secretary: MORI Takahiro(National Institute of AIST)
Tel +81-29-849-1149
E-Mail -aist |
Last modified: 2021-04-27 15:57:35
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