Conference Date	Thu, May 16, 2019 13:00 - 17:30 Fri, May 17, 2019 08:50 - 12:25
Topics	Materials, Fabrication, and Characterization of Functional Devices, and Related Technology
Conference Place	Hamamatsu Campus, Shizuoka University
Address	Johoku 3-5-1, Naka-ku, Hamamatsu-shi, 432-8011 Japan
Transportation Guide	When you get out of the north gate of Hamamatsu Station (JR), you take Enshu Railway Bus at bus stop No.15 or 16 and get off at the bus stop of "Shizuoka daigaku" (20 minutes by bus). http://gsst.shizuoka.ac.jp/english/others/access.html
Contact Person	Prof. Hiroya Ikeda +81-53-478-1317
Announcement	We have a reception.
	Please inform to Prof. Ikeda by May 8, 2019 if you hope to join.
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Copyright and reproduction	All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Registration Fee	This workshop will be held as the IEICE workshop in fully electronic publishing. Registration fee will be necessary except the speakers and participants other than the participants to workshop(s) in non-electronic publishing. See the registration fee page. We request the registration fee or presentation fee to participants who will attend the workshop(s) on SDM, ED, CPM.

Thu, May 16 PM  13:00 - 17:30
(1)	13:00-13:25	Study of influence of phonon drag effect on thermoelectromotive force of Si wire thermopile ED2019-10 CPM2019-1 SDM2019-8	Yuhei Suzuki, Khotimatul Fauziah (Shizuoka Univ.), Yoshinari Kamakura (Osaka Inst. Tech.), Takanobu Watanabe (Waseda Univ.), Faiz Salleh (Univ. of Malaya), Hiroya Ikeda (Shizuoka Univ.)
(2)	13:25-13:50	Dark Current Characteristics for Near-infrared pin Photodiodes of Ge Layer on Si ED2019-11 CPM2019-2 SDM2019-9	Mayu Tachibana, Shuhei Sonoi, Yasuhiko Ishikawa (Toyohashi Univ. Tech.)
(3)	13:50-14:15	Study of new stacked full adder circuit with fabrication technology of 3D flash memory. ED2019-12 CPM2019-3 SDM2019-10	Fumiya Suzuki, Shigeyoshi Watanabe (Shonan Inst. of Tech.)
(4)	14:15-14:40	VLS Growth of SnO2 Nanowires by Atmospheric-pressure CVD and Their Gassensing Properties ED2019-13 CPM2019-4 SDM2019-11	Tomoaki Terasako, Toshiki Kurashige, Hideyuki Marui, Goh Manabe (Ehime Univ.), Masakazu Yagi (Natl. Inst. Technol., Kagawa Coll.), Masami Mori, Yoshihiko Sadaoka (Ehime Univ.)
(5)	14:40-15:05	Characterizations of lattice strain and optical properties for Ge layers epitaxially grown on bonded Si-on-Quartz substrate ED2019-14 CPM2019-5 SDM2019-12	Kyosuke Noguchi (Toyohashi Univ. Tech.), Michiharu Nishimura (Univ. Tokyo), Junji Matui, Yoshiyuki Tsusaka (Univ. Hyogo), Yasuhiko Ishikawa (Toyohashi Univ. Tech.)
	15:05-15:25	Break ( 20 min. )
(6)	15:25-16:15	[Invited Talk] Electron Nano-Aspirator using Electron-Electron Scattering in Si ED2019-15 CPM2019-6 SDM2019-13	Yukinori Ono (Shisuoka Univ.)
(7)	16:15-16:40	Evaluation of switching characteristics of Ta2O5-δ based analog resistive memory using Cu and Ta top electrode ED2019-16 CPM2019-7 SDM2019-14	Yuanlin Li, Atsushi Tsurumaki-Fukuchi, Masashi Arita (Hokkaido Univ.), Takashi Morie (Kyushu Inst. Tech.), Yasuo Takahashi (Hokkaido Univ.)
(8)	16:40-17:05	Investigation of Spin Connection Parameters on Ising Spin Computing ED2019-17 CPM2019-8 SDM2019-15	Tsukasa Miki, Mitsuki Ito, Yuki Kushitani, Yosuke Hirata, Moe Shimada, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech.)
(9)	17:05-17:30	Investigation of Spin Decision Logics on 2D Ising Spin Computing ED2019-18 CPM2019-9 SDM2019-16	Moe Shimada, Mitsuki Ito, Yuki Kushitani, Yousuke Hirata, Tsukasa Miki, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech.)
Fri, May 17   08:50 - 12:25
(10)	08:50-09:15	Formation of Au Atomic Junctions Using Genetic Algorithm ED2019-19 CPM2019-10 SDM2019-17	Keita Takebayashi, Takuya Sakurai, Yosuke Hirata, Jun-ichi Shirakashi (Tokyo Univ. of Agr. & Tech.)
(11)	09:15-09:40	Nitriding by active screen plasma and its surface structure analysis ED2019-20 CPM2019-11 SDM2019-18	Susumu Ichimura, Seigo Takashima (Nagoya Industries Promotion Corporation), Ippei Tsuru, Daichi Ohkubo, Hideaki Matsuo, Mineo Goto (Nakanihon-Ro Kogyo Co., Ltd.)
(12)	09:40-10:05	Study of MgZnO thin film for soler power generation by sol-gel method ED2019-21 CPM2019-12 SDM2019-19	Sho Inoue, Yasushi Takano (Shizuoka Univ.)
(13)	10:05-10:30	Chemical Bath Deposition of ZnO Nanorods and UV Light Detection by PEDOT:PSS/ZnO Nanorods Heterojunctions ED2019-22 CPM2019-13 SDM2019-20	Tomoaki Terasako, Shohei Obara (Grad. School Sci. & Eng., Ehime Univ.), Suguru Namba, Naoto Hashikuni (Fac. Eng., Ehime Univ.), Masakazu Yagi (Natl. Inst. Technol., Kagawa Coll.), Yutaka Furubayashi, Tetsuya Yamamoto (Res. Inst., Kochi Univ. Technol.)
	10:30-10:45	Break ( 15 min. )
(14)	10:45-11:10	Characterization of flexible thermoelectric materials for wearable power generators ED2019-23 CPM2019-14 SDM2019-21	Hiroya Ikeda, Faizan Khan, Misa Ohkubo, Arockiyasamy Periyanayaga Kristy (Shizuoka Univ.), Toshitaka Yamakawa (Kumamoto Univ.), Kazushi Ikeda (NAIST), Masaru Shimomura, Kenji Murakami, Yasuhiro Hayakawa (Shizuoka Univ.), Faiz Salleh (Univ. Malaya), Yuhei Suzuki (Shizuoka Univ.)
(15)	11:10-11:35	Experimental Study on Optimization of 2D Random Nanostructure Formation and Electrical Readout for Nano Artifact Metrics ED2019-24 CPM2019-15 SDM2019-22	Renpeng Lu, Katsumi Shimizu, Xiang Yin (Hokkaido Univ.), Yosuke Ueba, Mikio Ishikawa, Mitsuru Kitamura (DNP), Seiya Kasai (Hokkaido Univ.)
(16)	11:35-12:00	Direct growth of Graphene using microwave surface wave plasma CVD and its analysis ED2019-25 CPM2019-16 SDM2019-23	Susumu Ichimura (Nagoya Industries Promotion Corporation), Riteshkumar Ratneshkumar Vishwakarma1, Zhu Rucheng, Masayoshi Umeno (C`s Techno Inc.)
(17)	12:00-12:25	Study of Fabrication Process for Nitride-based Semiconductor Integrated Circuits -- Threshold voltage control by Si-ion implantation -- ED2019-26 CPM2019-17 SDM2019-24	Hiroshi Okada, Taichi Yokoyama, Kiyomasa Miwa, Keisuke Yamane, Akihiro Wakahara, Hiroto Sekiguchi (Toyohashi Tech.)

Contact Address and Latest Schedule Information
ED	Technical Committee on Electron Devices (ED)   [Latest Schedule]
	Contact Address	Masataka Higashiwaki (NICT) TEL : +81-42-327-6092 Fax : +81-42-327-5527 E- : m Toshiyuki Oishi(Saga Unv.) TEL : 0952-28-8642 E- :oi104cc-u
CPM	Technical Committee on Component Parts and Materials (CPM)   [Latest Schedule]
	Contact Address
SDM	Technical Committee on Silicon Device and Materials (SDM)   [Latest Schedule]
	Contact Address	Tetsu Morooka(Toshiba Memory Corp.) Tel 059-390-7451 Fax 059-361-2739 E-: ba

Last modified: 2019-03-15 10:30:31