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| Chair |
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Hiroshige Hirano (TowerPartners Semiconductor) |
| Vice Chair |
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Shunichiro Ohmi (Tokyo Inst. of Tech.) |
| Secretary |
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Takahiro Mori (AIST), Nobuaki Kobayashi (Nihon Univ.) |
| Assistant |
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Taiji Noda (Panasonic), Tomoyuki Suwa (Tohoku Univ.) |
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| Conference Date |
Thu, Oct 21, 2021 10:45 - 16:50 |
| Topics |
Process Science and New Process Technology |
| Conference Place |
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Copyright
and
reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Registration Fee |
This workshop will be held as the IEICE workshop in fully electronic publishing. Registration fee will be necessary except the speakers and participants other than the participants to workshop(s) in non-electronic publishing. See the registration fee page. We request the registration fee or presentation fee to participants who will attend the workshop(s) on SDM. |
Thu, Oct 21 AM
10:00 - 16:50 |
| |
10:00-10:40 |
( 40 min. ) |
| |
10:40-10:45 |
Break ( 5 min. ) |
| (1) |
10:45-11:35 |
[Invited Talk]
Influence of Fluorine on Reliabilities of SiO2 and SixNy Films  SDM2021-44 |
Yuichiro Mitani (Tokyo City Univ.) |
| (2) |
11:35-12:00 |
Characterization of Gallium Oxide Thin Film Deposited by Sputtering Method SDM2021-45 |
Fuminobu Imaizumi (NIT, Oyama college) |
| |
12:00-13:00 |
Lunch Break ( 60 min. ) |
| (3) |
13:00-13:25 |
A study on Ar/N2-plasma sputtering gas pressure dependence on the LaBxNy insulator formation for non-volatile memory applications SDM2021-46 |
Eun-Ki Hong, Shun-ichiro Ohmi (Tokyo Tech.) |
| (4) |
13:25-13:50 |
A study on the effect of inter layers on ferroelectric nondoped HfO2 formation SDM2021-47 |
Masakazu Tanuma, Joong-Won Shin, Shun-ichiro Ohmi (Tokyo Tech.) |
| (5) |
13:50-14:15 |
A study on Hf-based MONOS nonvolatile memory with HfO2 and HfON tunneling layers for multi-bit/cell operation SDM2021-48 |
Pyo Jooyoung, Ihara Akio, Ohmi Shun-ichiro (Tokyo Tech.) |
| |
14:15-14:30 |
Break ( 15 min. ) |
| (6) |
14:30-15:20 |
[Invited Talk]
Device and Integration Technologies Realizing Silicon Quantum Computers SDM2021-49 |
Takahiro Mori (AIST) |
| (7) |
15:20-15:45 |
Highly sensitive TMR sensor and its application to bio-magnetic field measurement SDM2021-50 |
Mikihiko Oogane (Tohoku Univ.) |
| |
15:45-16:00 |
Break ( 15 min. ) |
| (8) |
16:00-16:25 |
Current Measurement Platform Applied for Statistical Measurement of Discharge Current due to Traps in SiN Dielectrics SDM2021-51 |
Koga Saito, Hayato Suzuki, Hyeonwoo Park, Rihito Kuroda (Tohoku Univ.), Akinobu Teramoto (Hiroshima Univ.), Tomoyuki Suwa, Shigetoshi Sugawa (Tohoku Univ.) |
| (9) |
16:25-16:50 |
Statistical analysis of RTN behavior on transistor structure, operating region, and carrier transport direction SDM2021-52 |
Ryo Akimoto, Rihito Kuroda, Takezo Mawaki, Shigotoshi Sugawa (Tohoku Univ.) |
| |
16:50-17:30 |
( 40 min. ) |
| Announcement for Speakers |
| General Talk | Each speech will have 20 minutes for presentation and 5 minutes for discussion. |
| Contact Address and Latest Schedule Information |
| SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
|
| Contact Address |
SDM Secretary: MORI Takahiro(National Institute of AIST)
Tel +81-29-849-1149
E-Mail   -    aist |
Last modified: 2021-10-12 11:12:17
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