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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, EID 2016-12-12
14:45		 Nara NAIST Suppression of Etch Pits by Control of Etching Modes in Electrochemical Etching of p-type 4H-SiC
Taro Enokizono, Tsunenobu Kimoto, Jun Suda (Kyoto Univ.) EID2016-22 SDM2016-103		 In the EC etching, only p-type SiC is selectively etched through the following mechanism. SiC is oxidized by holes suppl... [more] EID2016-22 SDM2016-103
pp.59-62
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