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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
ED, CPM, LQE |
2006-10-06 16:50 |
Kyoto |
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Effects of ion damage reduction due to N2+ on InN film growth on Si substrate by ECR-MBE method Tokuo Yodo, Teruya Shimada, Sumito Tagawa, Ryo Nishimoto, Shiro Hidaka, Keita Ishi, Hiroshi Segawa, Junichi Hirakawa, Yoshiyuki Harada (Osaka Inst.of Tech.) |
The problem of ECR-MBE method is to generate the N2+ ion from ECR plasma during growth that damages the film. The bad in... [more] |
ED2006-175 CPM2006-112 LQE2006-79 pp.121-125 |
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