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Committee Date Time Place Paper Title / Authors Abstract Paper #
ITS, IE, ITE-AIT, ITE-HI, ITE-ME [detail] 2014-02-17
13:50		 Hokkaido Hokkaido Univ. A generation scheme of protected templates for sparse representation-based face recognition
Masakazu Furukawa, Yuichi Muraki, Masaaki Fujiyoshi (Tokyo Metro. Univ.), Yoshihide Tonomura (NTT), Hitoshi Kiya (Tokyo Metro. Univ.) ITS2013-42 IE2013-107		  [more] ITS2013-42 IE2013-107
pp.73-78
SP, EA, SIP 2013-05-17
16:25		 Okayama   A Secure Face Recognition Method Using Kernel Sparse Representation
Masakazu Furukawa, Yuichi Muraki, Masaaki Fujiyoshi, Hitoshi Kiya (Tokyo Metro. Univ.) EA2013-27 SIP2013-27 SP2013-27		  [more] EA2013-27 SIP2013-27 SP2013-27
pp.157-162
CPM 2008-08-04
14:00		 Hokkaido Muroran Institute of Technology Development of Surface-Wave Plasma Generation Apparatus and Application to Semiconductor Processing
Hisashi Fukuda (Muroran Inst. Technol.), Masakazu Furukawa (ARIC) CPM2008-41		 We have developed a high-density surface-wave plasma apparatus for the application to next generation semiconductor fabr... [more] CPM2008-41
pp.1-4
EMD, CPM, LQE, OPE 2006-08-25
10:05		 Hokkaido Chitose Arcadia Plaza Development of Surface Wave Excitation Plasma Generation Apparatus and Application to Semiconductor Processing
Haruki Shoji, Hisashi Fukuda, Masakazu Furukawa (Muroran Inst. Tech.) 		 [more] EMD2006-37 CPM2006-67 OPE2006-79 LQE2006-44
pp.67-70
MW, OPE, EMT [detail] 2006-07-28
09:45		 Hokkaido   Numarical Analysis of Microwave Surface Plasma Processing by FDTD Method
Taiki Miyoshi, Hideki Kawaguchi, Masakazu Furukawa (Muroran Inst. Tech.) 		The Surface-wave enhanced plasma process is advanced method of semiconductor device fabrications. However, Relation betw... [more] MW2006-67 OPE2006-59
pp.175-180
 Results 1 - 5 of 5  /   
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