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Date Time
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Abstract
Paper #
SDM
2006-06-22
13:10
Hiroshima
Faculty Club, Hiroshima Univ.
Interfacial reaction in HfO2/SiO2/Si(001) during O2 anneal observed by high-resolution RBS
Zhao Ming
,
Kaoru Nakajima
,
Motofumi Suzuki
,
Kenji Kimura
(
Kyoto Univ.
),
Masashi Uematsu
(
NTT BRL
),
Kazuyoshi Torii
,
Satoshi Kamiyama
,
Yasuo Nara
(
Selete
),
Keisaku Yamada
(
Waseda Univ.
)
[more]
SDM2006-59
pp.99-102
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