IEICE Technical Report

Online edition: ISSN 2432-6380

Volume 121, Number 8

Silicon Device and Materials

Workshop Date : 2021-04-23 - 2021-04-24 / Issue Date : 2021-04-16

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Table of contents

SDM2021-1
[Invited Talk] Low-Temperature Crystallization of Group Ⅳ Semiconductor Thin Film and Novel Transistor Using Tunnel Injection
Naoto Matsuo, Akira Heya (Univ Hyogo)
pp. 1 - 6

SDM2021-2
[Invited Talk] Control of crystal orientation in single crystal Si strip formed by micro-chevron laser scanning
Wenchang Yeh (Shimane Univ.)
pp. 7 - 12

SDM2021-3
Issue of crystallization for LTPS TFT
Noguchi Takashi, OkadaTatsuya (Univ. Ryukyus)
pp. 13 - 14

SDM2021-4
[Invited Talk] Transistor application of polycrystalline Ge-based thin films
Kaoru Toko (Univ. of Tsukuba)
pp. 15 - 18

SDM2021-5
[Invited Talk] Challenge for oxide TFTs toward LTPS TFTs
Mamoru Furuta (Kochi Univ. of Technol.)
pp. 19 - 21

SDM2021-6
[Invited Talk] Hot Carrier Effect in Oxide Thin Film Transistors
Yukiharu Uraoka, Takanori Takahashi, Mami Fujii, Juan Paolo Bermundo, Mutsunori Uenuma (NAIST)
pp. 22 - 25

SDM2021-7
[Invited Talk] Improving the characteristics of graphene TFT using graphene/Ni compound semiconductor hetero-junction
Kazunori Ichikawa (NITM)
pp. 26 - 29

SDM2021-8
[Invited Talk] TFT liquid crystal display and it related properties and qualities of glass substrate
Taketsugu Itoh (IDC)
pp. 30 - 33

SDM2021-9
EFISHG measurement system for study of triboelectric generation and visualized electronic charge due to triboelectrification and peeling-electrification
Dai Taguchi, Takaaki Manaka, Iwamoto Mitsumasa (Tokyo Tech)
pp. 34 - 39

SDM2021-10
Mechanism and function of symbiotic dynamics in cellular metabolism
Takashi Amemiya (YNU)
pp. 40 - 42

SDM2021-11
In situ observation of protein immobilization fraction on solid/liquid interfaces
Naoki Matsuda, Hirotaka Okabe (AIST)
pp. 43 - 48

Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan